Y10S 430/11
Vinyl alcohol polymer or derivative
Y10S430/11 (Vinyl alcohol polymer or derivative) appears on 252 US grants and 60 published applications in this corpus.
Search patents in Y10S- Granted patents
- 252
- Published applications
- 60
- Assignees
- 103
- Inventors
- 508
- Latest grant
- 17 Mar 2015
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 3 | 0 |
| 1977 | 4 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 3 | 0 |
| 1981 | 11 | 0 |
| 1982 | 2 | 0 |
| 1983 | 4 | 0 |
| 1984 | 2 | 0 |
| 1985 | 9 | 0 |
| 1986 | 3 | 0 |
| 1987 | 2 | 0 |
| 1988 | 5 | 0 |
| 1989 | 9 | 0 |
| 1990 | 9 | 0 |
| 1991 | 7 | 0 |
| 1992 | 5 | 0 |
| 1993 | 14 | 0 |
| 1994 | 14 | 0 |
| 1995 | 15 | 0 |
| 1996 | 6 | 0 |
| 1997 | 9 | 0 |
| 1998 | 10 | 0 |
| 1999 | 5 | 0 |
| 2000 | 10 | 0 |
| 2001 | 15 | 6 |
| 2002 | 7 | 13 |
| 2003 | 12 | 13 |
| 2004 | 20 | 3 |
| 2005 | 9 | 8 |
| 2006 | 4 | 4 |
| 2007 | 4 | 2 |
| 2008 | 7 | 6 |
| 2009 | 3 | 1 |
| 2010 | 4 | 2 |
| 2011 | 1 | 1 |
| 2012 | 2 | 0 |
| 2013 | 0 | 1 |
| 2014 | 1 | 0 |
| 2015 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Chemically amplified positive resist composition and patterning process17 Mar 2015US 8,980,525 B2Shin-Etsu Chemical Co., Ltd.
- Chemically amplified negative resist composition and patterning process14 Oct 2014US 8,859,181 B2Shin-Etsu Chemical Co., Ltd.
- Method for formation of miniaturized pattern and resist substrate treatment solution for use in the method24 Jan 2012US 8,101,333 B2AZ Electronic Materials USA Corp.
- Base soluble polymers for photoresist compositions3 Jan 2012US 8,088,564 B2AZ Electronic Materials USA Corp.
- Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s1 Nov 2011US 8,048,609 B2Eastman Kodak Company
- Chemically amplified positive resist composition and patterning process31 Jan 2013US 2013/0026044 A1Shin-Etsu Chemical Co., Ltd.
- Chemically amplified negative resist composition and patterning process1 Sep 2011US 2011/0212390 A1Shin-Etsu Chemical Co., Ltd.
- Radiation-sensitive compositions and elements containing poly(vinyl hydroxyaryl carboxylic acid ester)s24 Jun 2010US 2010/0159390 A1Eastman Kodak Company
- Method for formation of miniaturized pattern and resist substrate treatment solution for use in the method28 Jan 2010US 2010/0021700 A1AZ Electronic Materials USA Corp.
- Base soluble polymers for photoresist compositions5 Mar 2009US 2009/0061347 A1AZ Electronic Materials USA Corp.
Most cited
By later US patents
- Method of making a semiconductor device utilizing a light-sensitive etching agent477US 3,960,559 AFuji Photo Film Co., Ltd. · 1976
- Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere121US 5,350,660 AWako Pure Chemical Industries, Ltd. · 1994
- Photopolymerizable compositions and elements for refractive index imaging84US 4,942,112 AE. I. Du Pont de Nemours and Company · 1990
- Photoresist, compounds for composing the photoresist, and method of forming pattern by using the photoresist77US 5,994,025 ANEC Corporation · 1999
- Radiation sensitive resin composition62US 5,679,495 AJapan Synthetic Rubber Co., Ltd. · 1997