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US 5,679,495 AGranted
Radiation sensitive resin composition
AssigneeJapan Synthetic Rubber Co., Ltd.
InventorsMikio Yamachika, Eiichi Kobayashi, Toshiyuki Ota, Akira Tsuji
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AssigneeJapan Synthetic Rubber Co., Ltd.
InventorsMikio Yamachika, Eiichi Kobayashi, Toshiyuki Ota, Akira Tsuji
Estimating the term…
A radiation sensitive resin composition which comprises (A) a polymer which becomes alkali-soluble in the presence of an acid and (B) a radiation sensitive acid generator which generates an acid upon irradiation with a radiation, said polymer (A) comprising two recurring units represented by the general formulas (1) and (2) and a recurring unit which acts to reduce the solubility of the polymer in an alkali developer after the irradiation: ##STR1## wherein R.sup.1 represents a hydrogen atom or a methyl group and R.sup.2 represents a hydrogen atom or a methyl group. Said composition provides a chemically amplified positive resist which can give a fine pattern with a good pattern shape, and said resist is freed from volume shrinkage, peeling failure and adhesive failure, is excellent in dry etching resistance and effectively reacts with various radiations to give a good pattern shape which is excellent in photolithographic process stability, said pattern shape having no thinned portion at the upper part.
A radiation sensitive resin composition which consists essentially of (A) a polymer which becomes alkali-soluble in the presence of an acid and (B) a radiation sensitive acid generator which generates an acid upon irradiation with a radiation, said polymer (A) comprising two recurring units A and B represented by the general formulas (1) and (2), respectively, and a recurring unit C which acts to reduce the solubility of the polymer in an alkali developer after the irradiation:
A radiation sensitive resin composition which consists essentially of (A) a polymer which becomes alkali-soluble in the presence of an acid and (B) a radiation sensitive acid generator which generates an acid upon irradiation with a radiation, said polymer (A) comprising two recurring units A and B represented by the general formulas (1) and (2) and a recurring unit C which acts to reduce the solubility of the polymer in an alkali developer after the irradiation:
Dependencies are inferred from the claim text.