Back to results
US 8,088,564 B2Granted
Base soluble polymers for photoresist compositions
AssigneeAZ Electronic Materials USA Corp.
InventorsDavid Abdallah, Francis Houlihan
Life of this patent
Estimating the term…
Abstract
Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at α-position and/or β-position and/or γ-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected are described.
Claims17
An antireflective composition comprising:
- (a) a base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at α-position and/or β-position and/or γ-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected, and where the base polymer has a sulfonyl group in the backbone of the polymer;
- and
- (b) at least one crosslinking agent.
An antireflective composition comprising:
- (a) a base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at α-position and/or β-position and/or γ-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected, and where the base polymer has a sulfonyl group in the backbone of the polymer;
- and
- (b) at least one crosslinking agent which is a glycoluril-formadehyde resin.
Dependencies are inferred from the claim text.