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US 2009/0061347 A1Published application
Base soluble polymers for photoresist compositions
AssigneeAZ Electronic Materials USA Corp.
InventorsDavid Abdallah, Francis Houlihan
Life of this patent
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Abstract
Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at α-position and/or β-position and/or γ-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected are described.
Claims17
Base soluble polymer comprising at least one sulfonyl group where at least one carbon atom at α-position and/or β-position and/or γ-position with respect to the sulfonyl group has a hydroxyl group, where the hydroxyl group is protected or unprotected.
Dependencies are inferred from the claim text.