Chemically amplified positive resist composition and patterning process
AssigneeShin-Etsu Chemical Co., Ltd.
InventorsHiroyuki Yasuda, Katsuya Takemura
Life of this patent
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Abstract
A chemically amplified positive resist composition is provided comprising an alkali-insoluble or substantially alkali-insoluble polymer having an acid labile group-protected acidic functional group, an alkyl vinyl ether polymer, a photoacid generator, and a benzotriazole compound in a solvent. The composition forms on a substrate a resist film of 5-100 μm thick which can be briefly developed to form a pattern at a high sensitivity and a high degree of removal or dissolution to bottom.
Claims17
A chemically amplified positive resist composition comprising (A) an organic solvent, (B) a base resin, (C) a photoacid generator, and (D) a benzotriazole compound,
- the benzotriazole compound (D) having the general formula (1) or (2):
- wherein P is hydrogen, hydroxyl, a substituted or unsubstituted alkyl, substituted or unsubstituted phenyl, sulfonic acid or derivative thereof, or —Z—Y, Z is an alkylene, cycloalkylene or alkylene ether group which may be substituted with carboxyl, Y is a hydroxyl, alkoxy, carboxyl or dialkylamino group, Q is hydrogen, halogen, hydroxyl, alkyl, alkoxy group or an organic group having the formula (3):
- wherein S is a C1-C12 alkyl or aldehyde group,
- wherein T is hydrogen, hydroxyl, a substituted or unsubstituted alkyl, or substituted or unsubstituted phenyl, and W is hydrogen, halogen, hydroxyl, alkyl or alkoxy,
- the base resin (B) comprising 100 parts by weight of a first polymer comprising recurring units
- represented by the general formula (7):
- wherein R7 is C4-C30 alkyl, 0.4≦p 0.8, 0<q≦0.5, 0<s≦0.3, and p+q+s=1, and having a weight average molecular weight of 5,000 to 100,000, and 2 to 30 parts by weight of a vinyl ether polymer consisting of recurring units represented by the general formula (5):
- wherein R8 is hydrogen or a straight or branched C1-C12 alkyl group, R9 is hydrogen or methyl, R10 is hydrogen or an organic group of the general formula (6):
- wherein R12 is hydrogen or methyl, R11 is an organic group of formula (6), nitrile or halogen, t and u are numbers in the range:
- t+u=1 and 0≦u≦0.5, and having a weight average molecular weight of 10,000 to 500,000.
A chemically amplified positive resist composition comprising (A) an organic solvent, (B) a base resin, (C) a photoacid generator, and (D) a benzotriazole compound,
- the benzotriazole compound (D) having the general formula (1) or (2):
- wherein P is hydrogen, hydroxyl, a substituted or unsubstituted alkyl, substituted or unsubstituted phenyl, sulfonic acid or derivative thereof, or —Z—Y, Z is an alkylene, cycloalkylene or alkylene ether group which may be substituted with carboxyl, Y is a hydroxyl, alkoxy, carboxyl or dialkylamino group, Q is hydrogen, halogen, hydroxyl, alkyl, alkoxy group or an organic group having the formula (3):
- wherein S is C1-C12 alkyl or aldehyde group,
- wherein T is hydrogen, hydroxyl, a substituted or unsubstituted alkyl, or substituted or unsubstituted phenyl, and W is hydrogen, halogen, hydroxyl, alkyl or alkoxy,
- the base resin (B) comprising 100 parts by weight of a first polymer comprising recurring units selected from the group consisting of formulae (4)-2 to (4)-5 and having a weight average molecular weight of 1,000 to 500,000 and 2 to 30 parts by weight of a vinyl ether polymer consisting of recurring units represented by the general formula (5) and having a weight average molecular weight of 10,000 to 500,000,
- wherein R1 is hydrogen, hydroxyl, straight alkyl, branched alkyl, halogen or trifluoromethyl, R2 is hydrogen, hydroxyl, halogen or trifluoromethyl, R3 is a C4-C12 tertiary alkyl group, R5 is hydrogen or methyl, R6 is hydrogen, methyl, alkoxycarbonyl, cyano, halogen or trifluoromethyl, R7 is C4-C30 alkyl, 0.4≦p≦0.8, 0<q≦0.5, 0<s≦0.3, and p+q+s=1,
- wherein R1 and R3 are as defined above, R4 is hydrogen, an acid labile group, or ditrifluoromethylhydroxyl, 0.4≦p≦0.8, 0<q≦0.5, 0.1≦r≦0.5, and p+q+r=1,
- wherein R1, R2, R3, R4, R5, R6 and R7 are as defined above, 0<q≦0.5, 0.2≦r<0.5, 0<s≦0.3, and q+r+s=1,
- wherein R1, R2, R3, R4, R5, R6 and R7 are as defined above, 0<q≦0.5, 0.3≦p≦0.8, 0.1≦r≦0.5, 0≦s≦0.3, and p+q+r+s=1.
- wherein R8 is hydrogen or a straight or branched C1-C12 alkyl group, R9 is hydrogen or methyl, R10 is hydrogen or an organic group of the general formula (6):
- wherein R12 is hydrogen or methyl, R11 is an organic group of formula (6), nitrile or halogen, t and u are numbers in the range:
- t+u=1 and 0<u≦0.5.
Dependencies are inferred from the claim text.