Y10S 430/109
Polyester
Y10S430/109 (Polyester) appears on 119 US grants and 29 published applications in this corpus.
Search patents in Y10S- Granted patents
- 119
- Published applications
- 29
- Assignees
- 72
- Inventors
- 280
- Latest grant
- 20 Feb 2018
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 4 | 0 |
| 1977 | 6 | 0 |
| 1978 | 3 | 0 |
| 1979 | 2 | 0 |
| 1980 | 2 | 0 |
| 1981 | 10 | 0 |
| 1982 | 3 | 0 |
| 1983 | 3 | 0 |
| 1984 | 4 | 0 |
| 1985 | 3 | 0 |
| 1986 | 2 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 2 | 0 |
| 1990 | 2 | 0 |
| 1991 | 1 | 0 |
| 1992 | 0 | 0 |
| 1993 | 5 | 0 |
| 1994 | 6 | 0 |
| 1995 | 3 | 0 |
| 1996 | 2 | 0 |
| 1997 | 2 | 0 |
| 1998 | 2 | 0 |
| 1999 | 7 | 0 |
| 2000 | 10 | 0 |
| 2001 | 4 | 0 |
| 2002 | 1 | 6 |
| 2003 | 2 | 5 |
| 2004 | 2 | 2 |
| 2005 | 5 | 4 |
| 2006 | 4 | 1 |
| 2007 | 2 | 2 |
| 2008 | 2 | 2 |
| 2009 | 3 | 3 |
| 2010 | 1 | 1 |
| 2011 | 2 | 0 |
| 2012 | 3 | 1 |
| 2013 | 0 | 1 |
| 2014 | 2 | 0 |
| 2015 | 0 | 1 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Radiation-sensitive composition20 Feb 2018US 9,897,913 B2Mitsubishi Gas Chemical Company, Inc.
- Radiation-sensitive composition30 Sep 2014US 8,846,292 B2Mitsubishi Gas Chemical Company, Inc.
- Chemically amplified positive resist composition for ArF immersion lithography and pattern forming process26 Aug 2014US 8,815,492 B2Shin-Etsu Chemical Co., Ltd.
- Radiation-sensitive composition7 Feb 2012US 8,110,334 B2Mitsubishi Gas Chemical Company, Inc.
- Heat-sensitive positive-working lithographic printing plate precursor7 Feb 2012US 8,110,338 B2Agfa Graphics NV
- Radiation-sensitive composition29 Jan 2015US 2015/0030980 A1Mitsubishi Gas Chemical Company, Inc.
- Chemically amplified positive resist composition for arf immersion lithography and pattern forming process2 May 2013US 2013/0108964 A1Shin-Etsu Chemical Co., Ltd.
- Radiation-sensitive composition5 Jul 2012US 2012/0171379 A1Mitsubishi Gas Chemical Company, Inc.
- Radiation-sensitive composition25 Feb 2010US 2010/0047709 A1Mitsubishi Gas Chemical Company, Inc.
- Coating Materials Consisting of Low- or Medium-Molecular Organic Compounds5 Nov 2009US 2009/0272295 A1Central Glass Company, Limited
Most cited
By later US patents
- Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone645US 4,491,628 AInternational Business Machines Corporation · 1985
- Method of making a semiconductor device utilizing a light-sensitive etching agent477US 3,960,559 AFuji Photo Film Co., Ltd. · 1976
- Cross-linked toner resins157US 5,227,460 AXerox Corporation · 1993
- Photoresist composition81US 5,492,793 AInternational Business Machines Corporation · 1996
- Photoresist compositions comprising polycyclic polymers with acid labile pendant groups55US 6,232,417 B1The B. F. Goodrich Company · 2001