Radiation-sensitive composition
AssigneeMitsubishi Gas Chemical Company, Inc.
InventorsMasatoshi ECHIGO, Dai OGURO
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AssigneeMitsubishi Gas Chemical Company, Inc.
InventorsMasatoshi ECHIGO, Dai OGURO
Estimating the term…
A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with good shape and a method of forming a resist pattern and novel compositions for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition. Radiation-sensitive composition containing a solvent and a cyclic compound having, e.g., a cyclic compound (A) having a molecular weight of 700 to 5000 which is synthesized by the condensation reaction of a compound having 2 to 59 carbon atoms and 1 to 4 formyl groups with a compound having 6 to 15 carbon atoms and 1 to 3 phenolic hydroxyl groups, and a cyclic compound for use in the radiation-sensitive composition.
A cyclic compound which is selected from the group consisting of the compounds represented by the following formula (2-1), formula (2-2), formula (33-1), formula (33-2), formula (33-0-1), and formula (33-0-2):
A radiation-sensitive composition comprising a cyclic compound represented by the following formula (1), a solvent and an acid crosslinking agent (G):
A radiation-sensitive composition comprising a cyclic compound (B) represented by the following formula (19-1) and a low-molecular weight solubilizer (D):
A method of producing a cyclic compound (B0), comprising a first stage reaction which an aldehyde compound in which an aldehyde compound (A1b) having from 2 to 59 carbon atoms, a reactive functional group and from 1 to 4 formyl groups is allowed to react with a reagent for introducing an acid-dissociating functional group, thereby synthesizing an aldehyde compound (A1c) having the acid-dissociating functional group introduced, and a second stage reaction in which the aldehyde compound (A1c) and a phenol compound (A2) are subjected to a condensation reaction, wherein the aldehyde compound (A1c) is represented by the following formula (47):
A method of producing a cyclic compound (B0), comprising a first stage reaction in which an aldehyde compound (A1d) having 2 to 59 carbon atoms, 1 to 4 formyl groups, and 1 to 2 carboxyl groups or ester groups and a phenol compound (A2) are subjected to a condensation reaction, thereby synthesizing a cyclic compound (A0) having 1 to 8 carboxyl groups and a molecular weight of 800 to 5000, and a second stage reaction in which the cyclic compound (A0) is allowed to react with a compound (A3) having a halomethyl ether group,
Dependencies are inferred from the claim text.