Radiation-sensitive composition
AssigneeMitsubishi Gas Chemical Company, Inc.
InventorsMasatoshi Echigo, Dai Oguro
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AssigneeMitsubishi Gas Chemical Company, Inc.
InventorsMasatoshi Echigo, Dai Oguro
Estimating the term…
A radiation-sensitive composition containing a resist compound having a high sensitivity, a high resolution, a high etching resistance, and a low outgas which forms a resist pattern with a good shape is described. Further described is a method of forming a resist pattern using the radiation-sensitive composition. Still further described are a novel composition for forming a photoresist under coat film which is excellent in optical properties and etching resistance and contains substantially no sublimable substance and an under coat film formed by the composition. Still further described are a radiation-sensitive composition containing a solvent and a cyclic compound having a specific structure, for example, a cyclic compound (A) having a molecular weight of 700 to 5000 which is synthesized by the condensation reaction of a compound having 2 to 59 carbon atoms and 1 to 4 formyl groups (aldehyde compound (A1)) with a compound having 6 to 15 carbon atoms and 1 to 3 phenolic hydroxyl groups (phenol compound (A2)), and a cyclic compound for use in the radiation-sensitive composition.
1-77. (canceled)
A cyclic compound represented by the following formula (1):
A method of producing a cyclic compound (B0), comprising a first stage reaction in which an aldehyde compound (A1b) having 2 to 59 carbon atoms, a reactive functional group and 1 to 4 formyl groups is allowed to react with a reagent for introducing an acid-dissociating functional group, thereby synthesizing an aldehyde compound (A1c) having the acid-dissociating functional group introduced, and a second stage reaction in which the aldehyde compound (A1c) and a phenol compound (A2) are subjected to a condensation reaction.
A method of producing a cyclic compound (B0), comprising a first stage reaction in which an aldehyde compound (A1d) having 2 to 59 carbon atoms, 1 to 4 formyl groups, and 1 to 2 carboxyl groups or ester groups and a phenol compound (A2) are subjected to a condensation reaction, thereby synthesizing a cyclic compound (A0) having 1 to 8 carboxyl groups and a molecular weight of 800 to 5000, and a second stage reaction in which the cyclic compound (A0) is allowed to react with a compound (A3) having a halomethyl ether group.
Dependencies are inferred from the claim text.