Y10S 430/108
Polyolefin or halogen containing
Y10S430/108 (Polyolefin or halogen containing) appears on 489 US grants and 365 published applications in this corpus.
Search patents in Y10S- Granted patents
- 489
- Published applications
- 365
- Assignees
- 123
- Inventors
- 692
- Latest grant
- 20 Feb 2018
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 6 | 0 |
| 1977 | 5 | 0 |
| 1978 | 1 | 0 |
| 1979 | 2 | 0 |
| 1980 | 3 | 0 |
| 1981 | 9 | 0 |
| 1982 | 2 | 0 |
| 1983 | 5 | 0 |
| 1984 | 3 | 0 |
| 1985 | 2 | 0 |
| 1986 | 1 | 0 |
| 1987 | 4 | 0 |
| 1988 | 1 | 0 |
| 1989 | 3 | 0 |
| 1990 | 10 | 0 |
| 1991 | 5 | 0 |
| 1992 | 4 | 0 |
| 1993 | 5 | 0 |
| 1994 | 10 | 0 |
| 1995 | 3 | 0 |
| 1996 | 2 | 0 |
| 1997 | 5 | 0 |
| 1998 | 5 | 0 |
| 1999 | 2 | 0 |
| 2000 | 4 | 0 |
| 2001 | 8 | 4 |
| 2002 | 8 | 42 |
| 2003 | 29 | 63 |
| 2004 | 48 | 44 |
| 2005 | 39 | 43 |
| 2006 | 43 | 29 |
| 2007 | 39 | 27 |
| 2008 | 16 | 26 |
| 2009 | 40 | 37 |
| 2010 | 30 | 18 |
| 2011 | 35 | 13 |
| 2012 | 20 | 13 |
| 2013 | 14 | 3 |
| 2014 | 10 | 2 |
| 2015 | 6 | 1 |
| 2016 | 0 | 0 |
| 2017 | 1 | 0 |
| 2018 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Radiation-sensitive composition20 Feb 2018US 9,897,913 B2Mitsubishi Gas Chemical Company, Inc.
- Fluorine-containing compounds and their polymers useful for anti-reflection film materials and resist compositions16 May 2017US 9,650,451 B2Central Glass Company, Limited
- Fluorinated monomer, polymer, resist composition, and patterning process25 Aug 2015US 9,115,074 B2Shin-Etsu Chemical Co., Ltd.
- Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern19 May 2015US 9,034,558 B2FUJIFILM Corporation
- Positive resist composition for immersion exposure and pattern-forming method using the same5 May 2015US 9,023,576 B2FUJIFILM Corporation
- Radiation-sensitive composition29 Jan 2015US 2015/0030980 A1Mitsubishi Gas Chemical Company, Inc.
- Fluorine-Containing Compounds and Their Polymers Useful for Anti-Reflection Film Materials and Resist Compositions19 Jun 2014US 2014/0171584 A1Central Glass Company, Limited
- Fluorinated monomer, polymer, resist composition, and patterning process24 Apr 2014US 2014/0114080 A1Shin-Etsu Chemical Co., Ltd.
- Pattern forming method, chemical amplification resist composition and resist film9 May 2013US 2013/0115556 A1FUJIFILM Corporation
- Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern9 May 2013US 2013/0115557 A1FUJIFILM Corporation
Most cited
By later US patents
- Polymer, resist composition, and patterning process146US 7,537,880 B2Shin-Etsu Chemical Co., Ltd. · 2009
- Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere121US 5,350,660 AWako Pure Chemical Industries, Ltd. · 1994
- Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable99US 5,310,619 AMicroSi, Inc. · 1994
- Photopolymerizable compositions and elements for refractive index imaging84US 4,942,112 AE. I. Du Pont de Nemours and Company · 1990
- Photoresist composition81US 5,492,793 AInternational Business Machines Corporation · 1996