Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming pattern

An actinic-ray- or radiation-sensitive resin composition containing (A) a compound that when exposed to actinic rays or radiation, generates an acid, (B) a resin that when acted on by an acid, increases its rate of dissolution in an alkali developer, and (C) a hydrophobic resin,

• characterized in that the hydrophobic resin (C) contains a repeating unit derived from any of monomers of general formula (1) below, and
• the hydrophobic resin (C) is contained in the composition in an amount of 0.01 to 20 mass % based on the total solids of the composition,
• in which
• R1 or the plurality of R1s when m=2 independently represent a hydrogen atom, a fluorine atom or an organic functional group,
• R2 or the plurality of R2s when n=2 independently represent a hydrogen atom, an optionally fluorinated alkyl group, an optionally fluorinated cycloalkyl group or an optionally fluorinated aryl group,
• R3 represents an oxygen atom or a single bond,
• Rf or the plurality of Rfs when m=2 independently represent an optionally fluorinated alkylene group, an optionally fluorinated cycloalkylene group or an optionally fluorinated arylene group,
• A represents, a group represented by the general formula below,
• in which R represents a hydrogen atom or a methyl group,
• B represents a single bond, an optionally fluorinated alkylene group, an optionally fluorinated cycloalkylene group or a sulfonyl group, provided that the alkylene group has carbon atoms optionally partially replaced by an oxygen atom,
• m is 1 or 2 when B is a single bond or an alkylene group, and is an integer of 0 to 2 when B is a sulfonyl group, and
• n is an integer of 0 to 2, satisfying the relationship n=2-m.