Y10S 430/113
With plasticizer
Official title: with plasticizer
Y10S430/113 (With plasticizer) appears on 53 US grants and 15 published applications in this corpus.
Search patents in Y10S- Granted patents
- 53
- Published applications
- 15
- Assignees
- 25
- Inventors
- 89
- Latest grant
- 23 Aug 2022
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 2 | 0 |
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 0 | 0 |
| 1981 | 2 | 0 |
| 1982 | 3 | 0 |
| 1983 | 2 | 0 |
| 1984 | 0 | 0 |
| 1985 | 1 | 0 |
| 1986 | 2 | 0 |
| 1987 | 3 | 0 |
| 1988 | 0 | 0 |
| 1989 | 2 | 0 |
| 1990 | 9 | 0 |
| 1991 | 2 | 0 |
| 1992 | 3 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 1 | 0 |
| 1998 | 2 | 0 |
| 1999 | 3 | 0 |
| 2000 | 1 | 0 |
| 2001 | 0 | 0 |
| 2002 | 0 | 0 |
| 2003 | 1 | 6 |
| 2004 | 2 | 2 |
| 2005 | 2 | 0 |
| 2006 | 3 | 3 |
| 2007 | 1 | 1 |
| 2008 | 1 | 0 |
| 2009 | 1 | 1 |
| 2010 | 0 | 0 |
| 2011 | 1 | 0 |
| 2012 | 0 | 0 |
| 2013 | 0 | 1 |
| 2014 | 0 | 0 |
| 2015 | 1 | 0 |
| 2016 | 0 | 0 |
| 2017 | 0 | 0 |
| 2018 | 0 | 0 |
| 2019 | 0 | 0 |
| 2020 | 0 | 0 |
| 2021 | 0 | 1 |
| 2022 | 1 | 0 |
By publication year. Applications have been published since 2001.
Recent patents
- Three-dimensional electronic device through organic solvent plasticization process of polymer frame, and method for manufacturing same23 Aug 2022US 11,424,163 B2Gwangju Institute of Science and Technology
- Photoresist composition1 Dec 2015US 9,201,303 B2Sumitomo Chemical Company, Limited
- Resist composition and pattern forming method using the same27 Dec 2011US 8,084,187 B2FUJIFILM Corporation
- Photoresist formulation for high aspect ratio plating21 Jul 2009US 7,563,559 B2FormFactor, Inc.
- Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same2 Sep 2008US 7,419,769 B2Tokyo Ohka Kogyo.Co., Ltd.
- Three-dimensional electronic device through organic solvent plasticization process of polymer frame, and method for manufacturing same4 Mar 2021US 2021/0066131 A1Gwangju Institute of Science and Technology
- Photoresist composition12 Dec 2013US 2013/0330669 A1Sumitomo Chemical Company, Limited
- Resist composition and pattern forming method using the same8 Oct 2009US 2009/0253070 A1FUJIFILM Corporation
- Photoresist Formulation For High Aspect Ratio Plating25 Oct 2007US 2007/0248896 A1FormFactor, Inc.
- Photoresist formulation for high aspect ratio plating29 Jun 2006US 2006/0141394 A1FormFactor, Inc.
Most cited
By later US patents
- Photosensitive block copolymer composition and elements140US 4,323,636 AE. I. Du Pont de Nemours and Company · 1982
- Holographic optical elements having a reflection hologram formed in a photopolymer112US 4,942,102 AE. I. Du Pont de Nemours and Company · 1990
- Photopolymerizable compositions and elements for refractive index imaging84US 4,942,112 AE. I. Du Pont de Nemours and Company · 1990
- Photopolymerizable composition containing a photosensitive donor and photoinitiating acceptor68US 4,571,377 ABattelle Memorial Institute · 1986
- Dry film process for altering wavelength response of holograms40US 4,959,283 AE. I. Du Pont de Nemours and Company · 1990