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US 2013/0330669 A1Published application
Photoresist composition
AssigneeSumitomo Chemical Company, Limited
InventorsMaki KAWAMURA, Junji NAKANISHI
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Abstract
A photoresist composition comprising: a resin which shows an increase in solubility in an aqueous alkali solution by an action of an acid; an acid generator; a plasticizer; and a solvent the amount of which is from 40 to 75% by mass of the total amount of the photoresist composition.
Claims14
A photoresist composition comprising:
- a resin which shows an increase in solubility in an aqueous alkali solution by an action of an acid;
- an acid generator;
- a plasticizer;
- and
- a solvent the amount of which is from 40 to 75% by mass of the total amount of the photoresist composition.
2 more elements
Dependencies are inferred from the claim text.