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US 8,084,187 B2Granted
Resist composition and pattern forming method using the same
AssigneeFUJIFILM Corporation
InventorsKazuyoshi Mizutani, Toru Tsuchihashi
Life of this patent
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Abstract
Provided is a resist composition including a compound having a molecular weight of 1,000 or less and containing at least one sulfonamide group (—SO2NH—).
Claims12
A resist composition comprising:
- a compound having a molecular weight of 1,000 or less and containing at least one sulfonamide group (—SO2NH—);
- wherein the compound containing at least one sulfonamide group contains the structure represented by the following formula (1)
- R1-L1-SO2NH-L2-R2 (1)
- wherein L1 represents a single bond, a carbonyl group, a carbonyloxy group, a sulfonyl group or a sulfonyloxy group,
- L2 represents a single bond, a carbonyl group, a carbonyloxy group, a sulfonyl group or a sulfonyloxy group, and
- each of R1 and R2 independently represents an organic group, provided that in the case where L2 is a single bond, R2 is an aryl group.
3 more elements
A positive resist composition comprising:
- (S) a compound having a molecular weight of 1,000 or less and containing at least one sulfonamide group (—SO2NH—);
- (B) a compound capable of increasing the solubility in an alkali developer by the action of an acid;
- and
- (A) a compound capable of generating an acid upon irradiation with an actinic ray or radiation;
- wherein the compound containing at least one sulfonamide group contains the structure represented by the following formula (1)
- R1-L1-SO2NH-L2-R2 (1)
- wherein L1 represents a single bond, a carbonyl group, a carbonyloxy group, a sulfonyl group or a sulfonyloxy group,
- L2 represents a single bond, a carbonyl group, a carbonyloxy group, a sulfonyl group or a sulfonyloxy group, and
- each of R1 and R2 independently represents an organic group, provided that in the case where L2 is a single bond, R2 is an aryl group.
6 more elements
Dependencies are inferred from the claim text.