H10P 14/60
Formation of materials: of insulating materials
Official title: of insulating materials
H10P14/60 (Formation of materials: of insulating materials) appears on 25,807 US grants and 27,467 published applications in this corpus.
Search patents in H10P- Granted patents
- 25,807
- Published applications
- 27,467
- Assignees
- 2,713
- Inventors
- 33,685
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 55 | 0 |
| 1977 | 75 | 0 |
| 1978 | 67 | 0 |
| 1979 | 56 | 0 |
| 1980 | 50 | 0 |
| 1981 | 51 | 0 |
| 1982 | 51 | 0 |
| 1983 | 49 | 0 |
| 1984 | 63 | 0 |
| 1985 | 73 | 0 |
| 1986 | 90 | 0 |
| 1987 | 78 | 0 |
| 1988 | 85 | 0 |
| 1989 | 78 | 0 |
| 1990 | 75 | 0 |
| 1991 | 100 | 0 |
| 1992 | 109 | 0 |
| 1993 | 130 | 0 |
| 1994 | 145 | 0 |
| 1995 | 124 | 0 |
| 1996 | 116 | 0 |
| 1997 | 166 | 0 |
| 1998 | 237 | 0 |
| 1999 | 363 | 0 |
| 2000 | 493 | 0 |
| 2001 | 729 | 295 |
| 2002 | 728 | 798 |
| 2003 | 754 | 921 |
| 2004 | 737 | 958 |
| 2005 | 569 | 974 |
| 2006 | 645 | 1041 |
| 2007 | 579 | 728 |
| 2008 | 496 | 706 |
| 2009 | 501 | 640 |
| 2010 | 543 | 540 |
| 2011 | 543 | 515 |
| 2012 | 432 | 554 |
| 2013 | 525 | 693 |
| 2014 | 620 | 909 |
| 2015 | 951 | 1432 |
| 2016 | 1348 | 1547 |
| 2017 | 1423 | 1580 |
| 2018 | 1386 | 1588 |
| 2019 | 1470 | 1701 |
| 2020 | 1606 | 1930 |
| 2021 | 1390 | 1550 |
| 2022 | 1166 | 1396 |
| 2023 | 1040 | 1339 |
| 2024 | 1000 | 1227 |
| 2025 | 1031 | 1196 |
| 2026 | 616 | 709 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- H10P 14/63Characterised by the formation processes18,393
- H10P 14/69Inorganic materials17,250
- H10P 14/66Characterised by the type of materials8,062
- H10P 14/65Characterised by treatments performed before or after the formation of the materials6,841
- H10P 14/68Organic materials2,493
- H10P 14/61Using masks1,145
Recent patents
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- Method of forming thin film6 Oct 2026US 12,757,655 B2Soulbrain Co., Ltd.
- Methods of patterning substrates8 Oct 2026US 2026/0307168 A1University of Rochester
- Method of forming protective film on outer circumferential portion including bevel portion of substrate8 Oct 2026US 2026/0311973 A1Ebara Corporation
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Most cited
By later US patents
- Semiconductor device and manufacturing method thereof4,349US 7,674,650 B2Semiconductor Energy Laboratory Co.Ltd. · 2010
- Semiconductor device and manufacturing method thereof4,064US 7,732,819 B2Semiconductor Energy Laboratory Co.Ltd. · 2010
- Fin structure of FinFET1,337US 9,093,530 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2015
- Contact structure of semiconductor device1,334US 8,823,065 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2014
- Atomic layer deposition with nitrate containing precursors1,176US 6,203,613 B1International Business Machines Corporation · 2001