H10P 14/61
Using masks
Official title: using masks
H10P14/61 (Using masks) appears on 1,145 US grants and 917 published applications in this corpus.
Search patents in H10P- Granted patents
- 1,145
- Published applications
- 917
- Assignees
- 291
- Inventors
- 2,267
- Latest grant
- 29 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 18 | 0 |
| 1977 | 14 | 0 |
| 1978 | 8 | 0 |
| 1979 | 6 | 0 |
| 1980 | 9 | 0 |
| 1981 | 9 | 0 |
| 1982 | 7 | 0 |
| 1983 | 5 | 0 |
| 1984 | 9 | 0 |
| 1985 | 9 | 0 |
| 1986 | 8 | 0 |
| 1987 | 3 | 0 |
| 1988 | 7 | 0 |
| 1989 | 9 | 0 |
| 1990 | 15 | 0 |
| 1991 | 13 | 0 |
| 1992 | 24 | 0 |
| 1993 | 24 | 0 |
| 1994 | 28 | 0 |
| 1995 | 23 | 0 |
| 1996 | 14 | 0 |
| 1997 | 31 | 0 |
| 1998 | 25 | 0 |
| 1999 | 33 | 0 |
| 2000 | 28 | 0 |
| 2001 | 23 | 4 |
| 2002 | 20 | 12 |
| 2003 | 13 | 8 |
| 2004 | 9 | 10 |
| 2005 | 3 | 6 |
| 2006 | 7 | 9 |
| 2007 | 2 | 4 |
| 2008 | 7 | 10 |
| 2009 | 5 | 7 |
| 2010 | 5 | 4 |
| 2011 | 7 | 5 |
| 2012 | 4 | 3 |
| 2013 | 5 | 10 |
| 2014 | 16 | 28 |
| 2015 | 30 | 54 |
| 2016 | 48 | 47 |
| 2017 | 49 | 67 |
| 2018 | 47 | 51 |
| 2019 | 62 | 72 |
| 2020 | 71 | 82 |
| 2021 | 61 | 83 |
| 2022 | 57 | 66 |
| 2023 | 53 | 104 |
| 2024 | 61 | 71 |
| 2025 | 61 | 64 |
| 2026 | 40 | 36 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method for fabricating semiconductor device29 Sep 2026US 12,751,222 B2Samsung Electronics Co., Ltd.
- Generation of multiline etch substrates25 Aug 2026US 12,721,060 B2Geminatio, Inc.
- Method of forming silicon nitride film and film forming apparatus25 Aug 2026US 12,721,063 B2Tokyo Electron Limited
- Methods of selective deposition and chemical delivery systems18 Aug 2026US 12,709,797 B2Lam Research Corporation
- Optical proximity correction method and photomask fabrication method using the same18 Aug 2026US 12,710,692 B2Samsung Electronics Co., Ltd.
- Defect inspection system employing an image enhancing model and a defect detection model, and method of using the same1 Oct 2026US 2026/0305263 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Method for forming alignment keys of semiconductor structure and semiconductor structure having alignment keys13 Aug 2026US 2026/0239996 A1United Microelectronics Corp.
- Electronic devices and circuits6 Aug 2026US 2026/0226608 A1Pragmatic Semiconductor Limited
- Vertical transistor including gate insulating layer and manufacturing method thereof23 Jul 2026US 2026/0214990 A1Unist (Ulsan National Institute of Science and Technology)
- Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium16 Jul 2026US 2026/0206504 A1Kokusai Electric Corporation
Most cited
By later US patents
- Method of patterning a material layer422US 9,570,302 B1Taiwan Semiconductor Manufacturing Company.Ltd · 2017
- Selective growth of silicon nitride383US 9,911,595 B1Lam Research Corporation · 2018
- Method for forming shallow trench isolation360US 5,712,185 AUnited Microelectronics Corp. · 1998
- Apparatus for surface conditioning237US 5,580,421 AFSI International, Inc. · 1996
- Technique for producing small islands of silicon on insulator210US 5,691,230 AMicron Technology, Inc. · 1997