H10P 14/00
Formation of materials
Official title: Formation of materials, e.g. in the shape of layers or pillars
H10P14/00 (Formation of materials) appears on 55,651 US grants and 60,735 published applications in this corpus.
Search patents in H10P- Granted patents
- 55,651
- Published applications
- 60,735
- Assignees
- 5,275
- Inventors
- 61,413
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 115 | 0 |
| 1977 | 125 | 0 |
| 1978 | 112 | 0 |
| 1979 | 109 | 0 |
| 1980 | 102 | 0 |
| 1981 | 91 | 0 |
| 1982 | 95 | 0 |
| 1983 | 99 | 0 |
| 1984 | 127 | 0 |
| 1985 | 163 | 0 |
| 1986 | 176 | 0 |
| 1987 | 186 | 0 |
| 1988 | 179 | 0 |
| 1989 | 228 | 0 |
| 1990 | 184 | 0 |
| 1991 | 235 | 0 |
| 1992 | 254 | 0 |
| 1993 | 320 | 0 |
| 1994 | 325 | 0 |
| 1995 | 292 | 0 |
| 1996 | 269 | 0 |
| 1997 | 328 | 0 |
| 1998 | 475 | 0 |
| 1999 | 669 | 0 |
| 2000 | 899 | 0 |
| 2001 | 1269 | 563 |
| 2002 | 1399 | 1662 |
| 2003 | 1443 | 1834 |
| 2004 | 1444 | 1924 |
| 2005 | 1178 | 2047 |
| 2006 | 1293 | 2130 |
| 2007 | 1213 | 1736 |
| 2008 | 1101 | 1628 |
| 2009 | 1168 | 1644 |
| 2010 | 1398 | 1726 |
| 2011 | 1388 | 1776 |
| 2012 | 1309 | 1898 |
| 2013 | 1582 | 2144 |
| 2014 | 2013 | 2651 |
| 2015 | 2511 | 3429 |
| 2016 | 3212 | 3394 |
| 2017 | 3224 | 3447 |
| 2018 | 2955 | 3231 |
| 2019 | 3106 | 3440 |
| 2020 | 3098 | 3587 |
| 2021 | 2691 | 3031 |
| 2022 | 2238 | 2846 |
| 2023 | 1994 | 2677 |
| 2024 | 2062 | 2513 |
| 2025 | 2060 | 2335 |
| 2026 | 1145 | 1442 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Semiconductor manufacturing apparatus member and semiconductor manufacturing apparatus6 Oct 2026US 12,753,480 B2Toto Ltd.
- Methods of growing metal-containing films6 Oct 2026US 12,753,498 B2APPLIED Materials.Inc.
- Indium phosphide substrate, method for manufacturing indium phosphide substrate, and semiconductor epitaxial wafer6 Oct 2026US 12,753,529 B2JX Advanced Metals Corporation
- Non-volatile memory device having primary memory layer with oxygen gradient6 Oct 2026US 12,757,411 B2Nanyang Technological University
- Enhancement-mode HEMT and manufacturing process of the same6 Oct 2026US 12,757,427 B2STMicroelectronics S,r.l.
- Methods of patterning substrates8 Oct 2026US 2026/0307168 A1University of Rochester
- Raw material for chemical deposition containing organoruthenium compound, and chemical deposition method using the raw material for chemical deposition8 Oct 2026US 2026/0308188 A1TANAKA PRECIOUS METAL TECHNOLOGIES Co., Ltd.
- Device and method for mist chemical vapor deposition of large-size semiconductor thin film8 Oct 2026US 2026/0308759 A1Tiangong University
- Method of forming protective film on outer circumferential portion including bevel portion of substrate8 Oct 2026US 2026/0311973 A1Ebara Corporation
- Semiconductor device and manufacturing method thereof8 Oct 2026US 2026/0313928 A1National Taiwan University
Most cited
By later US patents
- Semiconductor device and manufacturing method thereof4,349US 7,674,650 B2Semiconductor Energy Laboratory Co.Ltd. · 2010
- Semiconductor device and manufacturing method thereof4,064US 7,732,819 B2Semiconductor Energy Laboratory Co.Ltd. · 2010
- Methods of making thin film transistors comprising zinc-oxide-based semiconductor materials and transistors made thereby3,970US 7,402,506 B2Eastman Kodak Company · 2008
- LnCuO(S,Se,Te)monocrystalline thin film, its manufacturing method, and optical device or electronic device using the monocrystalline thin film3,969US 7,323,356 B2Japan Science and Technology Agency · 2008
- Field-effect transistor and method for manufacturing the same3,966US 7,411,209 B2Canon Kabushiki Kaisha · 2008