H01J 37/32862
In situ cleaning of vessels and/or internal parts
Official title: {In situ cleaning of vessels and/or internal parts}
H01J37/32862 (In situ cleaning of vessels and/or internal parts) appears on 882 US grants and 1,171 published applications in this corpus.
Search patents in H01J- Granted patents
- 882
- Published applications
- 1,171
- Assignees
- 238
- Inventors
- 2,894
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1987 | 1 | 0 |
| 1988 | 2 | 0 |
| 1989 | 2 | 0 |
| 1990 | 2 | 0 |
| 1991 | 2 | 0 |
| 1992 | 4 | 0 |
| 1993 | 8 | 0 |
| 1994 | 9 | 0 |
| 1995 | 15 | 0 |
| 1996 | 8 | 0 |
| 1997 | 12 | 0 |
| 1998 | 20 | 0 |
| 1999 | 21 | 0 |
| 2000 | 27 | 0 |
| 2001 | 28 | 13 |
| 2002 | 22 | 28 |
| 2003 | 22 | 27 |
| 2004 | 22 | 41 |
| 2005 | 18 | 41 |
| 2006 | 12 | 28 |
| 2007 | 15 | 36 |
| 2008 | 11 | 27 |
| 2009 | 15 | 34 |
| 2010 | 13 | 31 |
| 2011 | 25 | 25 |
| 2012 | 21 | 17 |
| 2013 | 14 | 22 |
| 2014 | 18 | 50 |
| 2015 | 29 | 63 |
| 2016 | 27 | 40 |
| 2017 | 41 | 45 |
| 2018 | 32 | 57 |
| 2019 | 35 | 43 |
| 2020 | 46 | 57 |
| 2021 | 31 | 64 |
| 2022 | 40 | 85 |
| 2023 | 48 | 95 |
| 2024 | 61 | 68 |
| 2025 | 52 | 69 |
| 2026 | 51 | 65 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
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- Substrate treatment apparatus and semiconductor device manufacturing method using the same15 Sep 2026US 12,738,464 B2Samsung Electronics Co., Ltd.
- Plasma processing system, assistance device, assistance method, and assistance program8 Sep 2026US 12,731,763 B2Tokyo Electron Limited
- Lower deposition chamber CCP electrode cleaning solution8 Sep 2026US 12,731,771 B2APPLIED Materials.Inc.
- Semiconductor cleaning apparatus and method8 Oct 2026US 2026/0307113 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Gas supply line arrangements1 Oct 2026US 2026/0297736 A1Lam Research Corporation
- Cleaning method and plasma processing apparatus24 Sep 2026US 2026/0290765 A1Tokyo Electron Limited
- Fluid dispensing system and method24 Sep 2026US 2026/0290766 A1ASML Netherlands B. V.
- Plasma output monitoring system24 Sep 2026US 2026/0290767 A1Asmpt Singapore Pte. Ltd.
Most cited
By later US patents
- Plasma cleaning method for removing residues in a plasma treatment chamber842US 5,356,478 ALam Research Corporation · 1994
- Remote plasma source seasoning624US 7,989,365 B2APPLIED Materials.Inc. · 2011
- Method for improved remote microwave plasma source for use with substrate processing system621US 6,271,148 B1APPLIED Materials.Inc. · 2001
- Plasma enhanced chemical processing reactor and method593US 5,792,272 AWatkins-Johnson Company · 1998
- Method of in situ cleaning a vacuum plasma processing chamber582US 5,679,215 ALam Research Corporation · 1997