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US 12,738,457 B2Granted
Remote plasma apparatus for generating high-power density microwave plasma
AssigneeApplied Materials, Inc.
InventorMehran Moalem
Life of this patent
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Abstract
Embodiments disclosed herein include a plasma source. In an embodiment, a plasma source comprises a dielectric body with a top surface, a bottom surface, and sidewall surfaces. In an embodiment, a plurality of holes pass through the dielectric body, where a first set of holes pass from the top surface to the bottom surface, and a second set of holes pass between opposite sidewall surfaces. In an embodiment, a housing is around the dielectric body, and a monopole antenna extending into the dielectric body.
Claims20
A plasma source, comprising:
- a dielectric body with a top surface, a bottom surface, and first and second sidewall surfaces, the first sidewall surface laterally opposite the second sidewall surface;
- a plurality of holes through the dielectric body, wherein a first set of holes pass from the top surface to the bottom surface, and a second set of holes pass from the first sidewall surface to the second sidewall surface;
- a housing around the dielectric body;
- and
- a monopole antenna having an end extending into but not entirely through the dielectric body, the end separated from the dielectric body by an antenna hole.
2 more elements
A plasma processing tool, comprising:
- a chamber, wherein the chamber is fluidically coupled to a pump that is configured to provide a sub-atmospheric pressure in the chamber;
- and
- a plasma source coupled to the chamber, wherein the plasma source comprises:
- a dielectric body with a top surface, a bottom surface, and first and second sidewall surfaces, the first sidewall surface laterally opposite the second sidewall surface;
- a plurality of holes through the dielectric body, wherein a first set of holes pass from the top surface to the bottom surface, and a second set of holes pass from the first sidewall surface to the second sidewall surface;
- a housing around the dielectric body;
- and
- a monopole antenna having an end extending into but not entirely through the dielectric body, the end separated from the dielectric body by an antenna hole.
5 more elements
A plasma processing tool, comprising:
- a chamber, wherein the chamber is fluidically coupled to a pump configured to provide a sub-atmospheric pressure in the chamber;
- and
- a remote plasma source coupled to the chamber, wherein the remote plasma source comprises:
- a dielectric body having a first sidewall surface laterally opposite a second sidewall surface;
- a plurality of holes passing through the dielectric body, wherein two or more of the plurality of holes intersect each other at a substantially orthogonal angle, and wherein one or more of the plurality of holes pass from the first sidewall surface to the second sidewall surface, and
- a monopole antenna having an end extending into but not entirely through the dielectric body through an antenna hole, the end separated from the dielectric body by the antenna hole, wherein the antenna hole does not intersect any of the plurality of holes.
3 more elements
Dependencies are inferred from the claim text.