Plasma output monitoring system
AssigneeAsmpt Singapore Pte. Ltd.
InventorsZhuofei GAN, Le CHENG, Lei YANG, Ming LI
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Abstract
In a method for monitoring a plasma output from a plasma device used to clean an object, a first wavelength of light emitted by the plasma output to be monitored is identified and an intensity of the first wavelength of light is sensed. A second wavelength of light emitted by the plasma output is also identified to be used as a baseline, and an intensity of the second wavelength of light is sensed. The intensities of the first and second wavelengths of light are then compared to determine whether their relationship falls within an acceptable threshold.
Claims19
A method for monitoring a plasma output from a plasma device used to clean an object, the method comprising:
- identifying a first wavelength of light emitted by the plasma output to be monitored;
- sensing an intensity of the first wavelength of light;
- identifying a second wavelength of light emitted by the plasma output as a baseline;
- sensing an intensity of the second wavelength of light;
- comparing the intensities of the first and second wavelengths of light;
- and
- determining whether a relationship between the sensed intensities of the first and second wavelengths of light falls within an acceptable threshold.
Dependencies are inferred from the claim text.