H01J 37/32853
Hygiene
Official title: {Hygiene}
H01J37/32853 (Hygiene) appears on 1,142 US grants and 1,483 published applications in this corpus.
Search patents in H01J- Granted patents
- 1,142
- Published applications
- 1,483
- Assignees
- 317
- Inventors
- 3,575
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1987 | 1 | 0 |
| 1988 | 3 | 0 |
| 1989 | 3 | 0 |
| 1990 | 2 | 0 |
| 1991 | 2 | 0 |
| 1992 | 4 | 0 |
| 1993 | 10 | 0 |
| 1994 | 12 | 0 |
| 1995 | 21 | 0 |
| 1996 | 14 | 0 |
| 1997 | 17 | 0 |
| 1998 | 25 | 0 |
| 1999 | 27 | 0 |
| 2000 | 41 | 0 |
| 2001 | 38 | 16 |
| 2002 | 34 | 37 |
| 2003 | 35 | 30 |
| 2004 | 28 | 45 |
| 2005 | 21 | 46 |
| 2006 | 14 | 30 |
| 2007 | 15 | 40 |
| 2008 | 11 | 32 |
| 2009 | 17 | 38 |
| 2010 | 16 | 35 |
| 2011 | 27 | 33 |
| 2012 | 24 | 24 |
| 2013 | 15 | 28 |
| 2014 | 19 | 66 |
| 2015 | 35 | 76 |
| 2016 | 40 | 71 |
| 2017 | 51 | 70 |
| 2018 | 43 | 83 |
| 2019 | 50 | 59 |
| 2020 | 61 | 74 |
| 2021 | 45 | 80 |
| 2022 | 49 | 102 |
| 2023 | 64 | 120 |
| 2024 | 70 | 79 |
| 2025 | 70 | 90 |
| 2026 | 68 | 79 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Shutter disc for a semiconductor processing tool6 Oct 2026US 12,753,488 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Flow control arrangements, semiconductor processing systems having flow control arrangements, and flow control methods6 Oct 2026US 12,753,499 B2ASM IP Holding B. V.
- Semiconductor manufacturing apparatus and semiconductor device manufacturing method6 Oct 2026US 12,755,946 B2Kioxia Corporation
- Remote plasma apparatus for generating high-power density microwave plasma15 Sep 2026US 12,738,457 B2APPLIED Materials.Inc.
- Substrate treatment apparatus and semiconductor device manufacturing method using the same15 Sep 2026US 12,738,464 B2Samsung Electronics Co., Ltd.
- Semiconductor cleaning apparatus and method8 Oct 2026US 2026/0307113 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Gas supply line arrangements1 Oct 2026US 2026/0297736 A1Lam Research Corporation
- Cleaning method and plasma processing apparatus24 Sep 2026US 2026/0290765 A1Tokyo Electron Limited
- Fluid dispensing system and method24 Sep 2026US 2026/0290766 A1ASML Netherlands B. V.
- Plasma output monitoring system24 Sep 2026US 2026/0290767 A1Asmpt Singapore Pte. Ltd.
Most cited
By later US patents
- Plasma cleaning method for removing residues in a plasma treatment chamber842US 5,356,478 ALam Research Corporation · 1994
- Remote plasma source seasoning624US 7,989,365 B2APPLIED Materials.Inc. · 2011
- Method for improved remote microwave plasma source for use with substrate processing system621US 6,271,148 B1APPLIED Materials.Inc. · 2001
- Method of operating a dual chamber reactor with neutral density decoupled from ion density606US 6,635,578 B1APPLIED Materials.Inc. · 2003
- Plasma enhanced chemical processing reactor and method593US 5,792,272 AWatkins-Johnson Company · 1998