H01J 2237/31711
Using mask
Official title: using mask
H01J2237/31711 (Using mask) appears on 83 US grants and 104 published applications in this corpus.
Search patents in H01J- Granted patents
- 83
- Published applications
- 104
- Assignees
- 42
- Inventors
- 161
- Latest grant
- 26 May 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 2 | 2 |
| 2003 | 1 | 0 |
| 2004 | 0 | 4 |
| 2005 | 1 | 4 |
| 2006 | 2 | 2 |
| 2007 | 1 | 2 |
| 2008 | 2 | 3 |
| 2009 | 4 | 4 |
| 2010 | 4 | 10 |
| 2011 | 3 | 11 |
| 2012 | 6 | 10 |
| 2013 | 5 | 6 |
| 2014 | 9 | 8 |
| 2015 | 9 | 4 |
| 2016 | 4 | 3 |
| 2017 | 3 | 3 |
| 2018 | 4 | 3 |
| 2019 | 5 | 6 |
| 2020 | 3 | 1 |
| 2021 | 2 | 2 |
| 2022 | 0 | 4 |
| 2023 | 3 | 4 |
| 2024 | 4 | 2 |
| 2025 | 1 | 1 |
| 2026 | 3 | 5 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Grid surface conditioning for ion beam system26 May 2026US 12,640,333 B2Veeco Instruments Inc.
- High incidence angle graphite for particle control with dedicated low sputter yield ion beam10 Mar 2026US 12,571,088 B2Axcelis Technologies, Inc.
- Ion implantation device with energy filter having additional thermal energy dissipation surface area3 Mar 2026US 12,567,559 B2Mi2-Factory GmbH
- Ion implantation device comprising energy filter and additional heating element9 Dec 2025US 12,494,337 B2Mi2-Factory GmbH
- Transmission electron microscope and imaging method31 Dec 2024US 12,183,542 B2Hitachi High-Tech Corporation
- Non-uniform subsrate processing using a scanned spot ion beam10 Sep 2026US 2026/0269168 A1APPLIED Materials.Inc.
- Angled ion implant to enable void-free filling of high aspect ratio trench21 May 2026US 2026/0143980 A1APPLIED Materials.Inc.
- Ion implantation device, mask set, and method for manufacturing semiconductor device19 Mar 2026US 2026/0081099 A1Kioxia Corporation
- Ion implantation device comprising energy filter and additional heating element5 Mar 2026US 2026/0066210 A1Mi2-Factory GmbH
- Angled beam exposure for hardmask based modification5 Feb 2026US 2026/0036910 A1Tokyo Electron Limited
Most cited
By later US patents
- Ion implantation apparatus, ion generating apparatus and semiconductor manufacturing method with ion implantation processes59US 6,614,033 B2Kabushiki Kaisha Toshiba · 2003
- Method of monitoring ion implants by examination of an overlying masking material52US 6,462,817 B12002
- Ion implantation apparatus, ion generating apparatus and semiconductor manufacturing method with ion implantation processes50US 6,335,534 B12002
- Use of chained implants in solar cells39US 7,727,866 B2Varian Semiconductor Equipment Associates, Inc. · 2010
- Hybrid focused-flood ion beam system and method31US 4,687,940 AHughes Aircraft Company · 1987