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US 12,494,337 B2Granted
Ion implantation device comprising energy filter and additional heating element
AssigneeMi2-Factory GmbH
InventorsFlorian Krippendorf, Constantin Csato
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Abstract
An ion implantation device (20) is provided comprising an energy filter (25) with a structured membrane, wherein the energy filter (25) is heated by absorbed energy from the ion beam, and at least one additional heating element (50a-d, 55a-d, 60, 70) for heating the energy filter (25).
Claims13
A method of implanting ions in a substrate material with an ion depth profile comprising:
- pre-heating an energy filter to at least a predetermined temperature, wherein the energy filter comprises a structured membrane;
- after the energy filter is preheated to the predetermined temperature, directing an ion beam through the energy filter to the substrate material for a pre-determined length of time;
- and
- cooling the energy filter after the pre-determined length of time.
1 more element
Dependencies are inferred from the claim text.