H01J 2237/0044
Of objects being observed or treated
Official title: of objects being observed or treated
H01J2237/0044 (Of objects being observed or treated) appears on 226 US grants and 209 published applications in this corpus.
Search patents in H01J- Granted patents
- 226
- Published applications
- 209
- Assignees
- 94
- Inventors
- 578
- Latest grant
- 18 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1985 | 1 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 1 | 0 |
| 1991 | 2 | 0 |
| 1992 | 4 | 0 |
| 1993 | 1 | 0 |
| 1994 | 5 | 0 |
| 1995 | 7 | 0 |
| 1996 | 5 | 0 |
| 1997 | 2 | 0 |
| 1998 | 2 | 0 |
| 1999 | 3 | 0 |
| 2000 | 4 | 0 |
| 2001 | 4 | 0 |
| 2002 | 6 | 5 |
| 2003 | 9 | 4 |
| 2004 | 7 | 7 |
| 2005 | 5 | 7 |
| 2006 | 6 | 9 |
| 2007 | 5 | 11 |
| 2008 | 6 | 7 |
| 2009 | 8 | 9 |
| 2010 | 7 | 10 |
| 2011 | 6 | 10 |
| 2012 | 7 | 8 |
| 2013 | 14 | 8 |
| 2014 | 15 | 9 |
| 2015 | 11 | 9 |
| 2016 | 5 | 9 |
| 2017 | 6 | 7 |
| 2018 | 10 | 7 |
| 2019 | 6 | 11 |
| 2020 | 8 | 7 |
| 2021 | 5 | 7 |
| 2022 | 7 | 9 |
| 2023 | 7 | 11 |
| 2024 | 9 | 11 |
| 2025 | 5 | 13 |
| 2026 | 5 | 4 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- System and method for plasma processing18 Aug 2026US 12,712,152 B2Tokyo Electron Limited
- Method, apparatus, and system for wafer grounding28 Jul 2026US 12,696,725 B2ASML Netherlands B. V.
- Member for semiconductor manufacturing apparatus7 Apr 2026US 12,598,952 B2NGK Insulators, Ltd.
- Image enhancement based on charge accumulation reduction in charged-particle beam inspection24 Mar 2026US 12,586,753 B2ASML Netherlands B. V.
- Support unit and substrate processing apparatus including same20 Jan 2026US 12,531,216 B2Psk Inc.
- Multi-beam charged particle microscope for inspection with reduced charging effects17 Sep 2026US 2026/0279715 A1
- Reactor design optimization with dc bias pulsing to pedestal30 Jul 2026US 2026/0221397 A1Lam Research Corporation
- Method of operating scanning electron microscope (sem) and method of manufacturing semiconductor device using the same11 Jun 2026US 2026/0162931 A1Samsung Electronics Co., Ltd.
- Multi-beam charged particle microscope for inspection with improved image contrast23 Apr 2026US 2026/0112572 A1
- Methods and devices for the contactless setting of an electrostatic charge of a sample20 Nov 2025US 2025/0357065 A1
Most cited
By later US patents
- Enhanced reactive DC sputtering system162US 5,718,813 AAdvanced Energy Industries, Inc. · 1998
- Plasma immersion ion implantation (PI.sup.3) apparatus149US 5,354,381 AVarian Associates, Inc. · 1994
- Thin film DC plasma processing system131US 5,427,669 AAdvanced Energy Industries, Inc. · 1995
- Plasma treatment apparatus having a workpiece-side electrode grounding circuit90US 5,665,167 ATokyo Electron Limited · 1997
- Method and apparatus for writing or etching narrow linewidth patterns on insulating materials87US 5,047,649 AInternational Business Machines Corporation · 1991