H01J 2237/0047
Using electromagnetic radiations
Official title: using electromagnetic radiations, e.g. UV, X-rays, light
H01J2237/0047 (Using electromagnetic radiations) appears on 35 US grants and 40 published applications in this corpus.
Search patents in H01J- Granted patents
- 35
- Published applications
- 40
- Assignees
- 22
- Inventors
- 111
- Latest grant
- 7 Oct 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1993 | 1 | 0 |
| 1994 | 0 | 0 |
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 0 | 0 |
| 2002 | 3 | 1 |
| 2003 | 1 | 1 |
| 2004 | 1 | 0 |
| 2005 | 0 | 0 |
| 2006 | 0 | 1 |
| 2007 | 0 | 3 |
| 2008 | 0 | 3 |
| 2009 | 3 | 2 |
| 2010 | 2 | 2 |
| 2011 | 2 | 1 |
| 2012 | 1 | 0 |
| 2013 | 2 | 1 |
| 2014 | 1 | 0 |
| 2015 | 1 | 1 |
| 2016 | 0 | 5 |
| 2017 | 2 | 1 |
| 2018 | 3 | 2 |
| 2019 | 1 | 1 |
| 2020 | 1 | 2 |
| 2021 | 0 | 2 |
| 2022 | 3 | 4 |
| 2023 | 2 | 2 |
| 2024 | 2 | 0 |
| 2025 | 2 | 5 |
By publication year. Applications have been published since 2001.
Recent patents
- Charged particle beam apparatus7 Oct 2025US 12,437,962 B2Hitachi High-Tech Corporation
- Beam manipulation of advanced charge controller module in a charged particle system4 Feb 2025US 12,217,927 B2ASML Netherlands B. V.
- Thermal-aided inspection by advanced charge controller module in a charged particle system22 Oct 2024US 12,125,669 B2ASML Netherlands B. V.
- Method and apparatus for monitoring beam profile and power1 Oct 2024US 12,105,036 B2ASML Netherlands B. V.
- Thermal-aided inspection by advanced charge controller module in a charged particle system15 Aug 2023US 11,728,131 B2ASML Netherlands B. V.
- Substrate processing apparatus and substrate processing method2 Oct 2025US 2025/0308921 A1Psk Inc.
- Measurement device and scanning image acquisition method7 Aug 2025US 2025/0253122 A1Hitachi High-Tech Corporation
- Charged particle-optical apparatus7 Aug 2025US 2025/0253123 A1ASML Netherlands B. V.
- Beam manipulation using charge regulator in a charged particle system22 May 2025US 2025/0166955 A1ASML Netherlands B. V.
- Charged particle-optical apparatus13 Mar 2025US 2025/0087445 A1ASML Netherlands B. V.
Most cited
By later US patents
- Method and apparatus for inspecting or measuring a sample based on charged-particle beam imaging, and a charged-particle beam apparatus44US 6,465,781 B1Hitachi, Ltd. · 2002
- Electrostatic chucking method33US 5,221,450 AKabushiki Kaisha Toshiba · 1993
- Method and apparatus for control of surface potential26US 5,432,345 A1995
- Charge neutralization of electron beam systems21US 6,465,795 B1APPLIED Materials.Inc. · 2002
- Method and apparatus for observing or processing and analyzing using a charged beam18US 6,476,387 B1Hitachi, Ltd. · 2002