Charge neutralization of electron beam systems
AssigneeApplied Materials, Inc.
InventorsJuan R. Madonado, Lee H. Veneklasen, Matthias Brunner, Ralf Schmid
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Abstract
In a charged particle or electron beam system, gas, such as argon or helium, is introduced over the surface of a substrate and ionized to neutralize charge accumulating on the surface from interactions caused by the impinging charged particles. The gas can be distributed throughout the gas chamber or confined to an area above the substrate. The radiation beam to ionize the gas can be directed across or towards the surface of the substrate. In the latter case, the gas pressure may be reduced to zero.
Claims40
A system for neutralizing charge in a charged particle system, comprising:
- a vacuum chamber;
- a substrate located within the vacuum chamber;
- a charged particle source directing a charged particle beam towards the substrate;
- a gas source introducing a gas into the vacuum chamber;
- and
- a radiation source generating a radiation beam to ionize the gas producing an ionized gas above the substrate, the ionized gas facilitates in neutralizing charge resulting from the charged particle beam.
A method of neutralizing charge in a charged particle system, comprising:
- ionizing a gas above the surface of a substrate located within a charged particle gas chamber to generate an ionized gas, the ionized gas facilitates in neutralizing charge resulting from the charged particle system.
Dependencies are inferred from the claim text.