Method and apparatus for observing or processing and analyzing using a charged beam

A method of observing or processing and analyzing the surface of a sample using a charged beam, comprising the steps of:

• placing a sample on a sample stage provided in a sample chamber, said sample being covered at least partially by an insulator film;
• irradiating said charged beam on the surface of said sample while said sample is placed on said sample stage and said sample chamber is evacuated;
• irradiating light only to a portion of the surface of said sample in an area ranged from a charged beam irradiation portion on the surface of said sample to the surface of a member grounded in said sample chamber, said light operating to excite the electrons in a material composing said insulator film;
• detecting secondary particles generated from the surface of said sample by irradiating said charged beam on the surface of said sample;
• and
• observing, processing, or analyzing the surface of said sample according to the information of said detected secondary particles.

An apparatus for observing or processing and analyzing the surface of a sample using a charged beam, comprising:

• a charged beam source for emitting a charged beam;
• a focusing optical system for focusing a charged beam emitted from said charged beam source, thereby irradiating a focused beam on said sample;
• a stage for holding said sample thereon;
• secondary particle detecting means for detecting secondary particles generated from said sample by irradiating said charged beam focused by said focusing optical system on said sample;
• and
• irradiating means for irradiating an ultraviolet light only to a portion of on the surface of said sample.

An apparatus for observing or processing and analyzing the surface of a sample using a charged beam, comprising:

• a sample chamber provided with a sample stage for holding a sample therein;
• evacuating means for evacuating said sample chamber;
• a charged beam source for emitting a charged beam;
• a focusing optical system for focusing said charged beam emitted from said charged beam source and irradiating a focused charged beam on the surface of said sample placed on said sample stage;
• secondary particle detecting means for detecting secondary particles generated from said sample by irradiating said charged beam focused by said focusing optical system on said sample;
• and
• ultraviolet light irradiating means for irradiating an ultraviolet light only to a portion of the surface of said sample in a charged beam irradiation area ranged from a charged beam irradiation portion on the surface of said sample to the surface of a member grounded in said sample chamber.