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US 12,217,927 B2Granted
Beam manipulation of advanced charge controller module in a charged particle system
AssigneeASML Netherlands B.V.
InventorsJian Zhang, Ning Ye, Zhiwen Kang, Yixiang Wang
Life of this patent
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Abstract
A system and a method for manipulating a beam of an Advanced Charge Controller module in different planes in an e-beam system are provided. Some embodiments of the system include a lens system configured to manipulate a beam in the tangential plane and the sagittal plane such that the beam spot is projected onto the wafer with high luminous energy. Some embodiments of the system include a lens system comprising at least two cylindrical lens.
Claims18
An electron beam system, the system comprising:
- an electron beam tool;
- and
- an advanced charge controller (ACC) module comprising:
- a laser source configured to emit a beam, and
- a lens system configured to shape the emitted beam by manipulating a fan angle of the emitted beam in a tangential plane and a fan angle of the beam in a sagittal plane for illuminating an area on a wafer beneath the electron beam tool.
2 more elements
A method for manipulating a beam in an electron beam system, the method comprising:
- emitting a beam from a laser source of an advanced charge controller (ACC) module;
- and
- shaping, using a lens system, the emitted beam by manipulating a fan angle of the emitted beam in a tangential plane independently from manipulating a fan angle of the emitted beam in a sagittal plane for illuminating an area on a wafer.
Dependencies are inferred from the claim text.