Methods and devices for the contactless setting of an electrostatic charge of a sample
OwnerDaniel Rhinowinventor
Life of this patent
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Abstract
The present application relates to a method and to a device for setting an electrostatic charge of a sample. The method comprises the following steps: (a) adjusting at least one parameter of at least one particle beam such that, on average, each particle, incident on the sample, of the at least one particle beam releases a predefined average number of electrons from the sample; and (b) irradiating the sample with the at least one adjusted particle beam in order to set the electrostatic charge of the sample.
Claims29
A method for setting an electrostatic charge of a sample, comprising:
- a. adjusting at least one parameter of at least one particle beam such that, on average, each particle, incident on the sample, of the at least one particle beam releases a predefined average number of electrons from the sample;
- b. irradiating the sample with the at least one adjusted particle beam at at least one first site in order to set the electrostatic charge of the sample;
- c. readjusting at least one parameter of the at least one particle beam and/or adjusting at least one other particle beam so as to enable analysis and/or processing of at least one second site of the sample;
- and
- d. irradiating the at least one second site of the sample with the readjusted at least one particle beam and/or the adjusted at least one other particle beam, wherein the at least one first site and the at least one second site are at a predefined distance and are electrically conductively connected to one another.
A method for setting an electrostatic charge of a sample, comprising:
- a. adjusting at least one parameter of at least one particle beam such that, on average, each particle, incident on the sample, of the at least one particle beam releases a predefined average number of electrons from the sample;
- b. irradiating the sample with the at least one adjusted particle beam in order to set the electrostatic charge of the sample;
- and
- c. providing at least one precursor gas at a processing site of the sample (in order to repair at least one defect in the sample during the irradiation of the sample with the at least one adjusted particle beam.
A device for setting an electrostatic charge of a sample, having:
- a. means for adjusting at least one parameter of at least one particle beam such that, on average, each particle, incident on the sample, of the at least one particle beam releases a predefined average number of electrons from the sample;
- b. means for irradiating the sample with the at least one adjusted particle beam at at least one first site in order to set the electrostatic charge of the sample;
- c. means for adjusting at least one other particle beam in order to analyze and/or process at least one second site of the sample;
- and
- d. means for irradiating the at least one second site of the sample with the readjusted at least one particle beam and/or the adjusted at least one other particle beam, wherein the at least one first site and the at least one second site are at a predefined distance and are electrically conductively connected to one another.
A device for setting an electrostatic charge of a sample, having:
- a. means for adjusting at least one parameter of at least one particle beam such that, on average, each particle, incident on the sample, of the at least one particle beam releases a predefined average number of electrons from the sample;
- b. means for irradiating the sample with the at least one adjusted particle beam in order to set the electrostatic charge of the sample;
- and
- c. means for providing at least one precursor gas at a processing site of the sample during the irradiation of the sample with the at least one adjusted particle beam in order to repair at least one defect in the sample.
Dependencies are inferred from the claim text.