C30B 25/12
Substrate holders or susceptors
C30B25/12 (Substrate holders or susceptors) appears on 593 US grants and 711 published applications in this corpus.
Search patents in C30B- Granted patents
- 593
- Published applications
- 711
- Assignees
- 303
- Inventors
- 1,496
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 2 | 0 |
| 1978 | 2 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 5 | 0 |
| 1982 | 2 | 0 |
| 1983 | 3 | 0 |
| 1984 | 4 | 0 |
| 1985 | 6 | 0 |
| 1986 | 9 | 0 |
| 1987 | 6 | 0 |
| 1988 | 1 | 0 |
| 1989 | 7 | 0 |
| 1990 | 5 | 0 |
| 1991 | 9 | 0 |
| 1992 | 10 | 0 |
| 1993 | 6 | 0 |
| 1994 | 7 | 0 |
| 1995 | 9 | 0 |
| 1996 | 11 | 0 |
| 1997 | 13 | 0 |
| 1998 | 17 | 0 |
| 1999 | 7 | 0 |
| 2000 | 17 | 0 |
| 2001 | 12 | 13 |
| 2002 | 21 | 14 |
| 2003 | 19 | 15 |
| 2004 | 13 | 19 |
| 2005 | 5 | 12 |
| 2006 | 8 | 19 |
| 2007 | 8 | 20 |
| 2008 | 8 | 18 |
| 2009 | 9 | 26 |
| 2010 | 11 | 21 |
| 2011 | 5 | 15 |
| 2012 | 5 | 26 |
| 2013 | 11 | 25 |
| 2014 | 13 | 36 |
| 2015 | 23 | 32 |
| 2016 | 16 | 31 |
| 2017 | 23 | 27 |
| 2018 | 21 | 26 |
| 2019 | 25 | 27 |
| 2020 | 22 | 25 |
| 2021 | 19 | 30 |
| 2022 | 26 | 47 |
| 2023 | 23 | 49 |
| 2024 | 32 | 49 |
| 2025 | 27 | 50 |
| 2026 | 28 | 39 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Injectors, liners, process kits, processing chambers, and related methods for gas flow in batch processing of semiconductor manufacturing6 Oct 2026US 12,753,500 B2APPLIED Materials.Inc.
- Silicon carbide single crystal manufacturing apparatus, computing device, and manufacturing method of silicon carbide single crystal6 Oct 2026US 12,753,528 B2Denso Corporation
- Heating apparatus, CVD equipment including the heating apparatus22 Sep 2026US 12,742,241 B2Advanced Micro-Fabrication Equipment Inc. China
- Vertical photo-assisted metal organic chemical vapor deposition (MOCVD) apparatus and deposition method using same22 Sep 2026US 12,742,257 B2Peking University
- Method and device for depositing an epitaxial layer on a substrate wafer made of semiconductor material8 Sep 2026US 12,729,441 B2Siltronic AG
- Device and method for mist chemical vapor deposition of large-size semiconductor thin film8 Oct 2026US 2026/0308759 A1Tiangong University
- Dynamic Seal Deposition Apparatus for Epitaxy8 Oct 2026US 2026/0308803 A1Atomic Nano Materials and Equipment Co., Ltd.
- Chamber kits, systems, and methods for calibrating temperature sensors for semiconductor manufacturing8 Oct 2026US 2026/0309552 A1APPLIED Materials.Inc.
- Systems, methods, and computer program products for substrate processing1 Oct 2026US 2026/0297804 A1ASM IP Holding B. V.
- Manufacturing method of silicon carbide wafer10 Sep 2026US 2026/0265950 A1Denso Corporation
Most cited
By later US patents
- Vertically-stacked process reactor and cluster tool system for atomic layer deposition876US 5,879,459 AGenus, Inc. · 1999
- Rapid thermal processing apparatus for processing semiconductor wafers624US 5,444,217 AMoore Epitaxial, Inc. · 1995
- Semiconductor wafer boat with reduced wafer contact area607US 6,099,302 ASamsung Electronics Co., Ltd. · 2000
- Susceptor for radiant absorption heater system567US 4,499,354 AGeneral Instrument Corporation · 1985
- Susceptor for a device for epitaxially growing objects and such a device566US 5,695,567 AABB Research Ltd. · 1997