Dynamic Seal Deposition Apparatus for Epitaxy

A dynamic sealing deposition apparatus for epitaxy, comprising a base plate, a positioning adjustment mechanism provided above the base plate, a lifting and rotating mechanism provided above the positioning adjustment mechanism, a magnetic fluid dynamic seal provided above the lifting and rotating mechanism, a process chamber provided above the magnetic fluid dynamic seal, and a holding and ejecting mechanism provided in the process chamber,

• wherein the positioning adjustment mechanism comprises an X-axis adjustment plate, a Y-axis adjustment plate and an adjustment assembly provided at one end of the X-axis adjustment plate and the Y-axis adjustment plate, a bottom of the X-axis adjustment plate being connected to the base plate via a first linear guide rail arranged transversely, and a bottom of the Y-axis adjustment plate being connected to the X-axis adjustment plate via a second linear guide rail arranged longitudinally,
• wherein the adjustment assembly comprises a first adjusting block provided on the base plate and a second adjusting block provided on the X-axis adjustment plate, the first adjusting block being provided with a first rotating knob connected to the second adjusting block, and the second adjusting block being provided with a second rotating knob connected to the Y-axis adjustment plate, wherein the first rotating knob and the second rotating knob are configured to be rotated in sequence to achieve horizontal adjustment of the lifting and rotating mechanism,
• wherein the holding and ejecting mechanism comprises a support arm, the top of the support arm being provided with a preheating ring, the bottom of the support arm being connected to the magnetic fluid dynamic seal, the inner top of the preheating ring being provided with a docking groove for holding a wafer, a push pin being slidably arranged on the support arm, and a position limiting support being disposed at the bottom of the process chamber opposite to the push pin, wherein the lifting and rotating mechanism is configured to drive the support arm to lift and rotate.