Systems, methods, and computer program products for substrate processing

A substrate processing method, comprising:

• at a semiconductor processing system including a chamber body, a gate valve abutting the chamber body, and a controller operably connected to the gate valve;
• opening the gate valve to load a substrate into the chamber body;
• closing the gate valve to deposit a material layer onto the loaded substrate;
• and
• opening the gate valve to unload the substrate with the material layer deposited thereon.

A computer program product, comprising:

• a non-transitory machine-readable medium having a plurality of program modules recorded on the medium, that when read by a controller, cause the controller to:
• open a gate valve abutting a chamber body operably associated with the controller to load a substrate into the chamber body;
• close, using the controller, the gate valve to deposit a material layer onto the substrate;
• and
• open, using the controller, the gate valve to unload the substrate with the material layer deposited thereon,
• wherein (a) one or more load operation to load the substrate into the chamber body is executed prior to loading the substrate into the chamber body, or (b) one or more unload operation to unload the substrate with the material layer deposited thereon is executed prior to unloading the substrate from the chamber body.