C23C 16/45546
Specially adapted for a substrate stack in the ald reactor
Official title: {specially adapted for a substrate stack in the ALD reactor}
C23C16/45546 (Specially adapted for a substrate stack in the ald reactor) appears on 434 US grants and 660 published applications in this corpus.
Search patents in C23C- Granted patents
- 434
- Published applications
- 660
- Assignees
- 75
- Inventors
- 781
- Latest grant
- 25 Aug 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 0 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 0 | 0 |
| 1994 | 0 | 0 |
| 1995 | 0 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 1 | 0 |
| 1999 | 1 | 0 |
| 2000 | 2 | 0 |
| 2001 | 1 | 2 |
| 2002 | 1 | 3 |
| 2003 | 3 | 15 |
| 2004 | 4 | 5 |
| 2005 | 5 | 17 |
| 2006 | 5 | 22 |
| 2007 | 8 | 19 |
| 2008 | 9 | 27 |
| 2009 | 7 | 28 |
| 2010 | 14 | 26 |
| 2011 | 23 | 22 |
| 2012 | 17 | 25 |
| 2013 | 20 | 22 |
| 2014 | 15 | 27 |
| 2015 | 26 | 49 |
| 2016 | 48 | 29 |
| 2017 | 17 | 23 |
| 2018 | 23 | 31 |
| 2019 | 18 | 33 |
| 2020 | 27 | 29 |
| 2021 | 23 | 21 |
| 2022 | 14 | 34 |
| 2023 | 20 | 50 |
| 2024 | 31 | 37 |
| 2025 | 33 | 36 |
| 2026 | 17 | 28 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium25 Aug 2026US 12,721,065 B2Kokusai Electric Corporation
- Method of manufacturing semiconductor device, method of processing substrate, substrate processing apparatus, and recording medium18 Aug 2026US 12,713,847 B2Kokusai Electric Corporation
- Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium7 Jul 2026US 12,677,612 B2Kokusai Electric Corporation
- Substrate processing apparatus and substrate processing method2 Jun 2026US 12,644,186 B2Tokyo Electron Limited
- Device for manufacturing a semiconductor device and method for manufacturing a semiconductor device using the same19 May 2026US 12,630,926 B2Samsung Electronics Co., Ltd.
- Processing apparatus for substrate1 Oct 2026US 2026/0297749 A1Nexusbe Co., Ltd
- A thin-film deposition apparatus for batch processing24 Sep 2026US 2026/0286515 A1Picosun Oy
- A thin-film deposition apparatus reaction chamber24 Sep 2026US 2026/0286520 A1Picosun Oy
- Device for manufacturing a semiconductor device and method for manufacturing a semiconductor device using the same17 Sep 2026US 2026/0275523 A1Samsung Electronics Co., Ltd.
- Method of processing substrate, method of manufacturing semiconductor device, recording medium, and substrate processing apparatus20 Aug 2026US 2026/0242944 A1Kokusai Electric Corporation
Most cited
By later US patents
- Vertically-stacked process reactor and cluster tool system for atomic layer deposition876US 5,879,459 AGenus, Inc. · 1999
- Method and equipment for growing thin films872US 5,711,811 AMikrokemia Oy · 1998
- Atomic layer deposition apparatus for depositing atomic layer on multiple substrates829US 6,042,652 AP.K. Ltd · 2000
- Method for performing growth of compound thin films750US 4,413,022 ACanon Kabushiki Kaisha · 1983
- Pretreatment processes within a batch ALD reactor566US 7,402,534 B2APPLIED Materials.Inc. · 2008