Method of processing substrate, method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
AssigneeKokusai Electric Corporation
InventorsTomiyuki Shimizu, Takashi Ozaki, Naonori Akae, Keigo Nishida
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Abstract
There is provided a technique that includes forming a film containing a predetermined element, oxygen, and nitrogen on the substrate by performing a cycle a predetermined number of times, the cycle including: (a) supplying a first precursor containing the predetermined element to the substrate; (b) supplying a second precursor having a molecular structure different from a molecular structure of the first precursor and containing the predetermined element and oxygen; (c) supplying an oxidizing agent to the substrate; and (d) supplying a nitriding agent to the substrate.
Claims18
A method of processing a substrate, comprising:
- forming a film containing a predetermined element, oxygen, and nitrogen on the substrate by performing a cycle a predetermined number of times, the cycle including:
- (a) supplying a first precursor containing the predetermined element to the substrate;
- (b) supplying a second precursor having a molecular structure different from a molecular structure of the first precursor and containing an alkoxy group bonded to an atom of the predetermined element to the substrate;
- (c) supplying an oxidizing agent to the substrate;
- and
- (d) supplying a nitriding agent to the substrate,
- wherein in (b), the second precursor is supplied to the substrate under a condition in which the alkoxy group is not detached from the atom of the predetermined element and at least one other group bonded to the atom of the predetermined element is detached and under a condition in which the atom of the predetermined element, where the at least one other group is detached and the bonding with the alkoxy group is maintained, is adsorbed onto a surface of the substrate.
A substrate processing apparatus comprising:
- a first precursor supply system configured to supply a first precursor containing a predetermined element to a substrate;
- a second precursor supply system configured to supply a second precursor having a molecular structure different from a molecular structure of the first precursor and containing an alkoxy group bonded to an atom of the predetermined element to the substrate;
- an oxidizing agent supply system configured to supply an oxidizing agent to the substrate;
- a nitriding agent supply system configured to supply a nitriding agent to the substrate;
- and
- a controller configured to be capable of controlling the first precursor supply system, the second precursor supply system, the oxidizing agent supply system, and the nitriding agent supply system, so as to perform forming a film containing the predetermined element, oxygen, and nitrogen on the substrate by performing a cycle a predetermined number of times, the cycle including:
- (a) supplying the first precursor to the substrate;
- (b) supplying the second precursor to the substrate;
- (c) supplying the oxidizing agent to the substrate;
- and
- (d) supplying the nitriding agent to the substrate,
- wherein in (b), the second precursor is supplied to the substrate under a condition in which the alkoxy group is not detached from the atom of the predetermined element and at least one other group bonded to the atom of the predetermined element is detached and under a condition in which the atom of the predetermined element, where the at least one other group is detached and the bonding with the alkoxy group is maintained, is adsorbed onto a surface of the substrate.
A non-transitory computer readable recording medium storing a program that causes, by a computer, a substrate processing apparatus to perform forming a film containing a predetermined element, oxygen, and nitrogen on a substrate by performing a cycle a predetermined number of times, the cycle including:
- (a) supplying a first precursor containing the predetermined element to the substrate;
- (b) supplying a second precursor having a molecular structure different from a molecular of the first precursor and containing an alkoxy group bonded to an atom of the predetermined element to the substrate;
- (c) supplying an oxidizing agent to the substrate;
- and
- (d) supplying a nitriding agent to the substrate,
- wherein in (b), the second precursor is supplied to the substrate under a condition in which the alkoxy group is not detached from the atom of the predetermined element and at least one other group bonded to the atom of the predetermined element is detached and under a condition in which the atom of the predetermined element, where the at least one other group is detached and the bonding with the alkoxy group is maintained, is adsorbed onto a surface of the substrate.
Dependencies are inferred from the claim text.