C23C 14/0036
Reactive sputtering
Official title: {Reactive sputtering}
C23C14/0036 (Reactive sputtering) appears on 1,366 US grants and 1,630 published applications in this corpus.
Search patents in C23C- Granted patents
- 1,366
- Published applications
- 1,630
- Assignees
- 767
- Inventors
- 3,900
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 6 | 0 |
| 1977 | 8 | 0 |
| 1978 | 10 | 0 |
| 1979 | 3 | 0 |
| 1980 | 4 | 0 |
| 1981 | 2 | 0 |
| 1982 | 3 | 0 |
| 1983 | 9 | 0 |
| 1984 | 9 | 0 |
| 1985 | 9 | 0 |
| 1986 | 4 | 0 |
| 1987 | 12 | 0 |
| 1988 | 5 | 0 |
| 1989 | 10 | 0 |
| 1990 | 11 | 0 |
| 1991 | 3 | 0 |
| 1992 | 13 | 0 |
| 1993 | 6 | 0 |
| 1994 | 17 | 0 |
| 1995 | 18 | 0 |
| 1996 | 15 | 0 |
| 1997 | 32 | 0 |
| 1998 | 29 | 0 |
| 1999 | 19 | 0 |
| 2000 | 27 | 0 |
| 2001 | 29 | 19 |
| 2002 | 36 | 32 |
| 2003 | 34 | 38 |
| 2004 | 35 | 35 |
| 2005 | 13 | 44 |
| 2006 | 6 | 34 |
| 2007 | 16 | 38 |
| 2008 | 17 | 48 |
| 2009 | 16 | 53 |
| 2010 | 24 | 56 |
| 2011 | 26 | 61 |
| 2012 | 37 | 109 |
| 2013 | 49 | 43 |
| 2014 | 50 | 76 |
| 2015 | 40 | 82 |
| 2016 | 52 | 81 |
| 2017 | 54 | 88 |
| 2018 | 58 | 67 |
| 2019 | 56 | 78 |
| 2020 | 58 | 90 |
| 2021 | 49 | 108 |
| 2022 | 55 | 84 |
| 2023 | 78 | 88 |
| 2024 | 64 | 84 |
| 2025 | 83 | 62 |
| 2026 | 47 | 32 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- C23C 14/0057Using reactive gases other than o2, h2o, n2, nh3 or ch4216
- C23C 14/0042Controlling partial pressure or flow rate of reactive or inert gases with160
- C23C 14/0073By exposing the substrates to reactive gases intermittently99
- C23C 14/0063Characterised by means for introducing or removing gases96
- C23C 14/0084Producing gradient compositions94
- C23C 14/0047Activation or excitation of reactive gases outside the coating chamber53
- C23C 14/0068Characterised by means for confinement of gases or sputtered material51
- C23C 14/0094In transition mode37
All 9 subgroupsShow fewer
Recent patents
- Layered substrate with reduced blue dot defect density22 Sep 2026US 12,742,990 B2Sage Electrochromics, Inc.
- Film forming apparatus and method for manufacturing part having film containing silicon15 Sep 2026US 12,734,543 B2Tokyo Electron Limited
- Particle reduction in physical vapor deposition of amorphous silicon1 Sep 2026US 12,723,304 B2APPLIED Materials.Inc.
- Surface treatment apparatus25 Aug 2026US 12,719,023 B2Shibaura Machine Co., Ltd.
- Strain resistance film, physical quantity sensor, and method for manufacturing the strain resistance film18 Aug 2026US 12,709,787 B2TDK Corporation
- Method for producing transparent conductive coatings for emi protection using hipims8 Oct 2026US 2026/0308745 A1Raytheon Company
- Heat-Treatable Coating with Blocking Layer Having Reduced Color Shift6 Aug 2026US 2026/0226603 A1Vitro Flat Glass LLC
- Max-ag electrically conductive composite coating and preparation method thereof6 Aug 2026US 2026/0226606 A1Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences
- Iron nitride magnetic material including coated nanoparticles6 Aug 2026US 2026/0229392 A1Regents of the University of Minnesota
- Deposition of ain on a silicon substrate and gan semiconductor transition layer structure6 Aug 2026US 2026/0231701 A1Epinovatech AB
Most cited
By later US patents
- Stationary aperture plate for reactive sputter deposition566US 5,415,753 AMaterials Research Corporation · 1995
- Forming tin thin films using remote activated specie generation418US 6,071,572 AAPPLIED Materials.Inc. · 2000
- Magnetron sputtering apparatus and process326US 4,851,095 AOptical Coating Laboratory, Inc. · 1989
- Endocurietherapy293US 5,342,283 A1994
- Heat treatable low-E coated articles and methods of making same275US 6,576,349 B2Centre Luxembourgeois de Recherches pour le Verra et la Ceramique S.A.(C.R.V.C.) · 2003