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US 12,709,787 B2Granted
Strain resistance film, physical quantity sensor, and method for manufacturing the strain resistance film
AssigneeTDK Corporation
InventorsKohei Nawaoka, Ken Unno, Tetsuya Sasahara, Masanori Kobayashi, Tetsuo Hata
Life of this patent
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Abstract
A strain resistance film containing a composition represented by Cr100-x-y-zAlxNyOz, satisfying 5≤x≤50, 0.1≤y≤20, 0.1≤z≤17, and y+z≤25.
Claims7
A strain resistance film comprising a composition represented by Cr100-x-y-zAlxNyOz, satisfying 5≤x≤50, 0.1≤y≤20, 0.1≤z≤17, and y+z≤25.
Dependencies are inferred from the claim text.