C23C 14/0089
In metallic mode
Official title: {in metallic mode}
C23C14/0089 (In metallic mode) appears on 30 US grants and 42 published applications in this corpus.
Search patents in C23C- Granted patents
- 30
- Published applications
- 42
- Assignees
- 31
- Inventors
- 80
- Latest grant
- 18 Nov 2025
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1995 | 1 | 0 |
| 1996 | 0 | 0 |
| 1997 | 0 | 0 |
| 1998 | 0 | 0 |
| 1999 | 0 | 0 |
| 2000 | 0 | 0 |
| 2001 | 1 | 0 |
| 2002 | 1 | 2 |
| 2003 | 2 | 2 |
| 2004 | 0 | 1 |
| 2005 | 0 | 0 |
| 2006 | 0 | 2 |
| 2007 | 0 | 2 |
| 2008 | 1 | 2 |
| 2009 | 1 | 2 |
| 2010 | 1 | 0 |
| 2011 | 3 | 1 |
| 2012 | 1 | 4 |
| 2013 | 1 | 3 |
| 2014 | 3 | 1 |
| 2015 | 0 | 2 |
| 2016 | 0 | 1 |
| 2017 | 1 | 2 |
| 2018 | 0 | 2 |
| 2019 | 2 | 3 |
| 2020 | 3 | 3 |
| 2021 | 3 | 1 |
| 2022 | 2 | 2 |
| 2023 | 0 | 0 |
| 2024 | 1 | 2 |
| 2025 | 2 | 0 |
| 2026 | 0 | 2 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method of depositing silicon nitride film, apparatus for depositing film, and silicon nitride film18 Nov 2025US 12,476,090 B2Ulvac, Inc.
- Use of titanium nitride as an electrode in non-faradaic electrochemical cell29 Jul 2025US 12,371,745 B2Roche Sequencing Solutions, Inc.
- System for forming nano-laminate optical coating13 Feb 2024US 11,897,811 B2Intevac, Inc.
- Film forming apparatus and film forming method using the same16 Aug 2022US 11,414,746 B2Canon Kabushiki Kaisha
- System for forming nano-laminate optical coating1 Feb 2022US 11,236,013 B2Intevac, Inc.
- Use of titanium nitride as an electrode in non-faradaic electrochemical cell4 Jun 2026US 2026/0152790 A1Roche Sequencing Solutions, Inc.
- Pulsing deposition using fast response mfc1 Jan 2026US 2026/0005028 A1APPLIED Materials.Inc.
- Conductive silicon sputtering targets15 Aug 2024US 2024/0271270 A1Soleras Advanced Coatings BV
- Method of depositing silicon nitride film, apparatus for depositing film, and silicon nitride film15 Feb 2024US 2024/0055239 A1Ulvac, Inc.
- Film forming apparatus and film forming method22 Dec 2022US 2022/0403503 A1Tokyo Electron Limited
Most cited
By later US patents
- Durable sputtered metal oxide coating48US 6,346,174 B1PPG Industries Ohio, Inc. · 2002
- Process and apparatus for reactive coating of a substrate24US 5,427,665 ALeybold Aktiengesellschaft · 1995
- Deposition processes for titanium nitride barrier and aluminum22US 7,824,743 B2APPLIED Materials.Inc. · 2010
- Methods of forming sputtering targets19US 8,197,894 B2H. C. Starck GmbH · 2012
- Coated article with IR reflecting layer and method of making same17US 7,597,962 B2Centre Luxembourgeois de Recherches pour le Verre et la Ceramique S.A. (C.R.V.C.) · 2009