Use of titanium nitride as an electrode in non-faradaic electrochemical cell
AssigneeRoche Sequencing Solutions, Inc.
InventorsJohn Foster, Jason Komadina
Life of this patent
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Abstract
A nanopore cell includes a conductive layer. The nanopore cell further includes a titanium nitride (TiN) working electrode disposed above the conductive layer. The nanopore cell further includes insulating walls disposed above the TiN working electrode, wherein the insulating walls and the TiN working electrode form a well into which an electrolyte may be contained. In some embodiments, the TiN working electrode comprises a spongy and porous TiN working electrode that is deposited by a deposition technique with conditions tuned to deposit sparsely-spaced TiN columnar structures or columns of TiN crystals above the conductive layer.
Claims10
A method of constructing a nanopore cell, comprising:
- depositing a first dielectric layer over a conductive layer;
- removing a portion of the first dielectric layer to form an opening over the conductive layer;
- depositing a layer of titanium nitride (TiN) in the opening over the conductive layer to form a TiN electrode;
- depositing a second dielectric layer over both the TiN electrode and the first dielectric layer;
- and
- removing a portion of the second dielectric layer to expose a portion of the TiN electrode and to form a well.
Dependencies are inferred from the claim text.