Surface treatment apparatus
AssigneeShibaura Machine Co., Ltd.
InventorsRintaro Sueki, Kazuhiro Fukada, Takeshi Namba
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AssigneeShibaura Machine Co., Ltd.
InventorsRintaro Sueki, Kazuhiro Fukada, Takeshi Namba
Estimating the term…
A surface treatment apparatus (10) performs film formation on a surface of a workpiece (W) in a chamber (20), and includes: an HCD electrode (210) (electrode) that supplies reaction gas to the workpiece (W) or a sputtering electrode (220) (electrode) that releases target particles to the workpiece (W), the HCD electrode (210) or the sputtering electrode (220) being placed facing the workpiece (W); a gas supply pipe (90) that is installed along an outer periphery of the electrode and has, along a longitudinal direction of the pipe, a plurality of gas ejection ports (91) through which film-forming gas, or an inert gas or a reactive gas for performing sputtering is supplied to an electrode surface of the electrode; and an exhaust device (51) (gas discharge unit) that discharges residual gas after film formation is ended, and the plurality of gas ejection ports (91) are arranged such that gas supplied from the gas supply pipe (90) is uniformly distributed on the electrode surface of the electrode.
A surface treatment apparatus that performs film formation on a surface of a workpiece in a chamber, the surface treatment apparatus comprising:
Dependencies are inferred from the claim text.