C23C 14/0063
Characterised by means for introducing or removing gases
Official title: {characterised by means for introducing or removing gases}
C23C14/0063 (Characterised by means for introducing or removing gases) appears on 96 US grants and 118 published applications in this corpus.
Search patents in C23C- Granted patents
- 96
- Published applications
- 118
- Assignees
- 82
- Inventors
- 301
- Latest grant
- 15 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1977 | 1 | 0 |
| 1978 | 1 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 0 | 0 |
| 1982 | 0 | 0 |
| 1983 | 0 | 0 |
| 1984 | 2 | 0 |
| 1985 | 0 | 0 |
| 1986 | 0 | 0 |
| 1987 | 0 | 0 |
| 1988 | 0 | 0 |
| 1989 | 1 | 0 |
| 1990 | 0 | 0 |
| 1991 | 0 | 0 |
| 1992 | 2 | 0 |
| 1993 | 0 | 0 |
| 1994 | 2 | 0 |
| 1995 | 0 | 0 |
| 1996 | 1 | 0 |
| 1997 | 5 | 0 |
| 1998 | 2 | 0 |
| 1999 | 0 | 0 |
| 2000 | 1 | 0 |
| 2001 | 3 | 2 |
| 2002 | 2 | 3 |
| 2003 | 4 | 4 |
| 2004 | 6 | 5 |
| 2005 | 0 | 6 |
| 2006 | 1 | 1 |
| 2007 | 2 | 6 |
| 2008 | 0 | 2 |
| 2009 | 1 | 2 |
| 2010 | 1 | 4 |
| 2011 | 0 | 3 |
| 2012 | 2 | 6 |
| 2013 | 1 | 1 |
| 2014 | 0 | 4 |
| 2015 | 4 | 5 |
| 2016 | 3 | 6 |
| 2017 | 3 | 4 |
| 2018 | 5 | 7 |
| 2019 | 5 | 3 |
| 2020 | 1 | 6 |
| 2021 | 3 | 4 |
| 2022 | 3 | 9 |
| 2023 | 7 | 9 |
| 2024 | 5 | 6 |
| 2025 | 9 | 7 |
| 2026 | 6 | 3 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Film forming apparatus and method for manufacturing part having film containing silicon15 Sep 2026US 12,734,543 B2Tokyo Electron Limited
- Surface treatment apparatus25 Aug 2026US 12,719,023 B2Shibaura Machine Co., Ltd.
- Film formation apparatus and film formation method of gallium nitride film11 Aug 2026US 12,703,910 B2Japan Display Inc.
- Oxide film preparation method26 May 2026US 12,637,754 B2Beijing Naura Microelectronics Equipment Co., Ltd.
- Method for forming an LiCoO2 film and device for carrying out same17 Feb 2026US 12,553,122 B2
- Apparatus and method for depositing sublimated matrix to a substrate2 Jul 2026US 2026/0185210 A1Technische UniversitäT Wien
- Process for making antiinflammatory, antibacterial, antifungal and viricidal materials11 Jun 2026US 2026/0157890 A1Kheprion, Inc.
- Metal chloride gas generation method and apparatus26 Mar 2026US 2026/0085418 A1SanDisk Technologies LLC
- Sputtering target, sputtering apparatus including the sputtering target, and method for manufacturing display device using the sputtering target11 Sep 2025US 2025/0285862 A1Samsung Display Co., Ltd.
- Coating Control System and Method of Controlling a Coating14 Aug 2025US 2025/0257445 A1Vitro Flat Glass LLC
Most cited
By later US patents
- Method and apparatus for producing MIIIN columns and MIIIN materials grown thereon106US 6,692,568 B2Kyma Technologies, Inc. · 2004
- Apparatus for the reactive coating of a substrate68US 5,169,509 ALeybold Aktiengesellschaft · 1992
- High flow gas manifold for high rate, off-axis sputter deposition61US 5,667,650 AE. I. Du Pont de Nemours and Company · 1997
- MIIIN based materials and methods and apparatus for producing same56US 6,784,085 B2North Carolina State University · 2004
- Process and apparatus for forming stoichiometric layer of a metal compound by closed loop voltage controlled reactive sputtering53US 5,108,569 AAPPLIED Materials.Inc. · 1992