Method for forming an LiCoO2 film and device for carrying out same

A method of forming a LiCoO2 film involving a deposition of a LiCoO2 layer on a substrate, the method comprising:

• heating a lithium tank to a temperature sufficient to vaporize lithium metal, the temperature being above a lithium melting point and effective to form a vapor-phase lithium flow;
• feeding a gas-carrier flow through the lithium tank in a manner that results in a controlled feeding of lithium vapor from the lithium tank to a magnetron system via a gas distributor, wherein the gas distributor is connected to a working gas input and a lithium tank input;
• regulating a supply of the lithium vapor from the heated lithium tank by changing the gas-carrier flow;
• operating a spectrometer to control a deposition rate and stoichiometry of LiCoO2 and;
• conducting the deposition of the LiCoO2 layer on the substrate by reactive magnetron sputtering of a metal cobalt (Co) target in the lithium vapor onto the substrate in a vacuum chamber.

A technological LiCoO2 film forming device comprising:

• a vacuum chamber with a magnetron system with a cobalt metal target;
• a gas distributor, wherein the gas distributor is located on one side of the magnetron system or around its perimeter;
• a spectrometer, wherein the spectrometer is mounted to an end of the magnetron system, wherein the spectrometer is operative to control a deposition rate and stoichiometry of LiCoO2;
• and
• a lithium tank, wherein the lithium tank is configured to heat lithium metal to a temperature sufficient to produce vapor-phase lithium for delivery to the magnetron system, wherein the gas distributor is connected to a working gas input via a first valve and/or a first tap, wherein the gas distributor is connected to a lithium tank input via a second valve and/or second tap, wherein the lithium tank is connected to a gas-carrier input.