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US 5,169,509 AGranted
Apparatus for the reactive coating of a substrate
AssigneeLeybold Aktiengesellschaft
InventorsRudolf Latz, Michael Schanz, Michael Scherer, Joachim Szczyrbowski
Life of this patent
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Abstract
A pair of magnetron cathodes in an evacuable coating chamber are each connected to an ungrounded output of an A.C. power supply. The discharge voltage of at least one of the cathodes is measured and the flow of reactive gas into the chamber is controlled so that the measured voltage is identical to a desired voltage.
Claims5
Apparatus for reactively sputter coating a substrate with an electrically insulating material, comprising
- an evacuable coating chamber,
- means in said chamber for distributing a process gas in said chamber,
- means in said chamber for distributing a reactive gas in said chamber,
- an A.C. power supply having two ungrounded outputs,
- a pair of magnetron cathodes each enclosing a plurality of magnets and holding a target to be sputtered in said chamber, each cathode being connected to a respective ungrounded output of said A.C. power supply and exhibiting a discharge voltage during operation,
- means for measuring the discharge voltage of at least one of said cathodes and producing a measured voltage, and
- flow control means for controlling the flow of reactive gas to said reactive gas distribution means in such a manner that the measured voltage is identical to a desired voltage.
4 more elements
Dependencies are inferred from the claim text.