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US 2026/0085418 A1Published application
Metal chloride gas generation method and apparatus
AssigneeSanDisk Technologies LLC
InventorHiraku ISHIKAWA
Life of this patent
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Abstract
A metal chloride gas generation method includes generating a plasma of a chlorine-containing source gas, and reacting chlorine ions or radicals from the plasma with a solid target metal source to generate the metal chloride gas.
Claims20
A metal chloride gas generation method, comprising:
- generating a plasma of a chlorine-containing source gas;
- and
- reacting chlorine ions or radicals from the plasma with a solid target metal source to generate the metal chloride gas.
A method, comprising:
- generating a metal chloride gas in a metal chloride gas generator;
- providing the metal chloride gas from the metal chloride gas generator to a buffer tank through a first gas flow conduit;
- storing the metal chloride gas in the buffer tank;
- and
- providing the metal chloride gas from the buffer tank to a process unit through a second gas flow conduit to etch a material located on a substrate in the process unit or to deposit a material layer on a substrate located in the process unit.
2 more elements
An apparatus, comprising:
- a metal chloride gas generator configured to generate a process source gas comprising a metal chloride gas, wherein the metal chloride gas generator comprises a plasma generator configured to generate a plasma of a chlorine-containing source gas, and a solid target metal source that is exposed to or is located downstream of the plasma generator;
- a process unit comprising a vacuum enclosure configured to hold a substrate therein and to receive the process source gas;
- and
- a buffer tank located between the metal chloride gas generator and the process unit, and configured to receive the process gas from the metal chloride gas generator and to provide the process source gas to the process unit.
1 more element
Dependencies are inferred from the claim text.