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AssigneeTechnische UniversitäT Wien
InventorsMartina Marchetti-Deschmann, Martin Handelshauser, Mathis Nalbach, Philipp Thurner, Peter Sandbichler
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The invention relates to an apparatus for depositing sublimated matrix (1) to a substrate (2) comprised of a sublimation chamber (3) with a pressure adjustment unit (4) adapted to adjust the gas pressure (pv) inside the sublimation chamber (3), a substrate holder (5), and a matrix container (6) being arranged at a distance from the substrate holder (5), wherein the substrate holder (5) and the matrix container (6) are arranged within the sublimation chamber (3), wherein the substrate holder (5) comprises a cooling unit (7) adapted to apply a predetermined temperature (Ts) to the substrate (2), and wherein the matrix container (6) comprises a heating unit (8) adapted to apply a predetermined temperature (Tm) to the matrix (1), wherein the apparatus comprises a gas supply unit (9) adapted to introduce a stream of heated gas at a temperature (Tg) of above 50° C., preferably of above 100° C., into the sublimation chamber (3). The invention further relates to a method.
An apparatus for depositing sublimated matrix (1) to a substrate (2), the apparatus comprising
A method depositing a sublimated matrix (1) to a substrate (2), the method comprising the following steps:
Dependencies are inferred from the claim text.