H10W 10/0125
Comprising introducing electrical impurities in local oxidation regions
Official title: {comprising introducing electrical impurities in local oxidation regions, e.g. to alter LOCOS oxide growth characteristics}
H10W10/0125 (Comprising introducing electrical impurities in local oxidation regions) appears on 498 US grants and 117 published applications in this corpus.
Search patents in H10W- Granted patents
- 498
- Published applications
- 117
- Assignees
- 129
- Inventors
- 777
- Latest grant
- 1 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 9 | 0 |
| 1977 | 8 | 0 |
| 1978 | 8 | 0 |
| 1979 | 7 | 0 |
| 1980 | 10 | 0 |
| 1981 | 11 | 0 |
| 1982 | 5 | 0 |
| 1983 | 14 | 0 |
| 1984 | 18 | 0 |
| 1985 | 8 | 0 |
| 1986 | 12 | 0 |
| 1987 | 15 | 0 |
| 1988 | 14 | 0 |
| 1989 | 13 | 0 |
| 1990 | 13 | 0 |
| 1991 | 15 | 0 |
| 1992 | 13 | 0 |
| 1993 | 11 | 0 |
| 1994 | 21 | 0 |
| 1995 | 16 | 0 |
| 1996 | 14 | 0 |
| 1997 | 19 | 0 |
| 1998 | 24 | 0 |
| 1999 | 30 | 0 |
| 2000 | 30 | 0 |
| 2001 | 31 | 10 |
| 2002 | 15 | 10 |
| 2003 | 5 | 8 |
| 2004 | 10 | 12 |
| 2005 | 9 | 4 |
| 2006 | 3 | 4 |
| 2007 | 8 | 6 |
| 2008 | 1 | 9 |
| 2009 | 7 | 3 |
| 2010 | 4 | 1 |
| 2011 | 1 | 2 |
| 2012 | 0 | 0 |
| 2013 | 1 | 4 |
| 2014 | 3 | 4 |
| 2015 | 2 | 4 |
| 2016 | 5 | 3 |
| 2017 | 10 | 9 |
| 2018 | 4 | 4 |
| 2019 | 4 | 2 |
| 2020 | 7 | 5 |
| 2021 | 1 | 2 |
| 2022 | 3 | 2 |
| 2023 | 1 | 2 |
| 2024 | 1 | 4 |
| 2025 | 2 | 2 |
| 2026 | 2 | 1 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Donor substrate for the transfer of a thin layer and associated transfer method1 Sep 2026US 12,727,448 B2Commissariat A L' Energie Atomique Et Aux Energies Alternatives
- Universal electrically inactive devices for integrated circuit packages14 Apr 2026US 12,604,522 B2Intel Corporation
- Bulk nanosheet with dielectric isolation22 Jul 2025US 12,369,367 B2Adeia Semiconductor Solutions LLC
- Apparatuses and methods for organizing data in a memory device11 Mar 2025US 12,249,377 B2
- Method of fabricating a semiconductor device23 Jan 2024US 11,881,508 B2Samsung Electronics Co., Ltd.
- Bulk nanosheet with dielectric isolation21 May 2026US 2026/0143765 A1Adeia Semiconductor Solutions LLC
- Method for oxidising a silicon layer25 Dec 2025US 2025/0391702 A1Commissariat A L' Energie Atomique Et Aux Energies Alternatives
- Apparatuses and methods for organizing data in a memory device12 Jun 2025US 2025/0191969 A1Lodestar Licensing Group LLC
- Semiconductor device and method of manufacturing same19 Dec 2024US 2024/0421198 A1Rohm Co., Ltd.
- Method of manufacturing a semiconductor device22 Aug 2024US 2024/0282582 A1Taiwan Semiconductor Manufacturing Company.Ltd
Most cited
By later US patents
- Process for producing the field oxide of an integrated circuit477US 4,455,193 ACommissariat A L' Energie Atomique · 1984
- Fabrication of complementary n-channel and p-channel circuits (ICs) useful in the manufacture of dynamic random access memories (drams)117US 5,272,367 AMicron Technology, Inc. · 1993
- Manufacturing a field oxide region for a semiconductor device115US 4,570,325 AKabushiki Kaisha Toshiba · 1986
- Modular bipolar-CMOS-DMOS analog integrated circuit & power transistor technology114US 6,855,985 B2Advanced Analogic Technologies (Hong Kong) Limited · 2005
- Semiconductor chip having fieldless array with salicide gates and methods for making same113US 6,174,758 B1Tower Semiconductor Ltd. · 2001