H10P 72/7618
Characterised by a movable susceptor, stage or support, others than those only
Official title: {characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating carrousel}
H10P72/7618 (Characterised by a movable susceptor, stage or support, others than those only) appears on 1,432 US grants and 1,948 published applications in this corpus.
Search patents in H10P- Granted patents
- 1,432
- Published applications
- 1,948
- Assignees
- 402
- Inventors
- 3,726
- Latest grant
- 22 Sep 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 2 | 0 |
| 1977 | 0 | 0 |
| 1978 | 0 | 0 |
| 1979 | 1 | 0 |
| 1980 | 0 | 0 |
| 1981 | 2 | 0 |
| 1982 | 0 | 0 |
| 1983 | 3 | 0 |
| 1984 | 3 | 0 |
| 1985 | 3 | 0 |
| 1986 | 1 | 0 |
| 1987 | 1 | 0 |
| 1988 | 0 | 0 |
| 1989 | 3 | 0 |
| 1990 | 3 | 0 |
| 1991 | 2 | 0 |
| 1992 | 4 | 0 |
| 1993 | 5 | 0 |
| 1994 | 3 | 0 |
| 1995 | 6 | 0 |
| 1996 | 5 | 0 |
| 1997 | 8 | 0 |
| 1998 | 7 | 0 |
| 1999 | 6 | 0 |
| 2000 | 4 | 0 |
| 2001 | 5 | 2 |
| 2002 | 8 | 10 |
| 2003 | 11 | 15 |
| 2004 | 10 | 9 |
| 2005 | 10 | 14 |
| 2006 | 9 | 20 |
| 2007 | 8 | 23 |
| 2008 | 7 | 36 |
| 2009 | 10 | 35 |
| 2010 | 19 | 32 |
| 2011 | 20 | 36 |
| 2012 | 23 | 41 |
| 2013 | 24 | 55 |
| 2014 | 32 | 53 |
| 2015 | 35 | 53 |
| 2016 | 41 | 76 |
| 2017 | 56 | 116 |
| 2018 | 64 | 150 |
| 2019 | 105 | 168 |
| 2020 | 132 | 170 |
| 2021 | 117 | 163 |
| 2022 | 117 | 194 |
| 2023 | 124 | 149 |
| 2024 | 157 | 139 |
| 2025 | 134 | 106 |
| 2026 | 82 | 83 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Method of measuring positional deviation of substrate stage and substrate processing apparatus22 Sep 2026US 12,745,595 B2Tokyo Electron Limited
- Multi-wafer handling system22 Sep 2026US 12,745,602 B2Tel Manufacturing and Engineering of America, Inc.
- Method of operation of semiconductor processing tool15 Sep 2026US 12,740,374 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Substrate support unit, and apparatus and method for depositing a layer using the same15 Sep 2026US 12,740,377 B2Evatec AG
- Method and device for depositing an epitaxial layer on a substrate wafer made of semiconductor material8 Sep 2026US 12,729,441 B2Siltronic AG
- Substrate chucking assist module8 Oct 2026US 2026/0314330 A1APPLIED Materials.Inc.
- Apparatus for processing substrate and method of transferring substrate8 Oct 2026US 2026/0314331 A1Tokyo Electron Limited
- Substrate processing apparatus and substrate processing method1 Oct 2026US 2026/0305224 A1Shibaura Mechatronics Corporation
- Movable rack system and operating method of the same1 Oct 2026US 2026/0305257 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Wafer transfer apparatus and semiconductor inspection device1 Oct 2026US 2026/0305259 A1Zhongke Jingyuan Electron Limited, Beijing (CN)
Most cited
By later US patents
- Rapid thermal processing apparatus for processing semiconductor wafers624US 5,444,217 AMoore Epitaxial, Inc. · 1995
- Method and apparatus for minimizing contamination in semiconductor processing chamber554US 8,287,648 B2ASM America, Inc. · 2012
- Susceptor546US 7,393,418 B2Covalent Materials Corporation · 2008
- Perimeter partition-valve with protected seals and associated small size process chambers and multiple chamber systems529US 7,682,454 B2Sundew Technologies, LLC · 2010
- Apparatus and method for controlling temperature uniformity of substrates485US 6,492,625 B1Emcore Corporation · 2002