Method of measuring positional deviation of substrate stage and substrate processing apparatus

A substrate processing apparatus comprising:

• a processing container;
• a substrate stage provided rotatably inside the processing container;
• and
• a controller,
• wherein the controller is configured to control the processing container and the substrate stage to execute:
• detecting an initial position of a substrate transferred by an arm that transfers the substrate;
• placing the substrate on the substrate stage;
• rotating the substrate by a predetermined rotational angle by rotating the substrate stage;
• delivering the substrate after rotation from the substrate stage to the arm;
• detecting a position of the substrate after rotation transferred by the arm;
• and
• calculating a positional deviation amount of the substrate stage with respect to the initial position of the substrate based on the initial position of the substrate, the position of the substrate after rotation, and the rotational angle.