Substrate processing apparatus and substrate processing method

Abstract

A substrate processing apparatus according to an embodiment includes a rotary holding portion including a holding portion for holding a substrate and a rotary body having an upper surface facing a bottom surface of the substrate held by the holding portion, the rotary holding portion rotating the substrate by rotating the holding portion and the rotary body, a first gas supply portion for supplying a first gas for cooling into a space between the upper surface of the rotary body and the substrate held by the holding portion, a first liquid supply portion for supplying a first liquid to the substrate held by the holding portion, and a second liquid supply portion for supplying a second liquid having a temperature of 0° C. or higher to the upper surface of the rotary body.

Dependencies are inferred from the claim text.