H10P 72/0471
Comprising at least one ion or electron beam chamber
Official title: {comprising at least one ion or electron beam chamber}
H10P72/0471 (Comprising at least one ion or electron beam chamber) appears on 313 US grants and 405 published applications in this corpus.
Search patents in H10P- Granted patents
- 313
- Published applications
- 405
- Assignees
- 125
- Inventors
- 997
- Latest grant
- 21 Jul 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1981 | 1 | 0 |
| 1982 | 0 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 0 | 0 |
| 1986 | 2 | 0 |
| 1987 | 1 | 0 |
| 1988 | 1 | 0 |
| 1989 | 1 | 0 |
| 1990 | 1 | 0 |
| 1991 | 0 | 0 |
| 1992 | 0 | 0 |
| 1993 | 2 | 0 |
| 1994 | 2 | 0 |
| 1995 | 3 | 0 |
| 1996 | 2 | 0 |
| 1997 | 1 | 0 |
| 1998 | 3 | 0 |
| 1999 | 4 | 0 |
| 2000 | 5 | 0 |
| 2001 | 5 | 4 |
| 2002 | 8 | 10 |
| 2003 | 6 | 13 |
| 2004 | 7 | 10 |
| 2005 | 8 | 8 |
| 2006 | 11 | 9 |
| 2007 | 9 | 13 |
| 2008 | 4 | 19 |
| 2009 | 10 | 7 |
| 2010 | 6 | 15 |
| 2011 | 9 | 15 |
| 2012 | 14 | 13 |
| 2013 | 14 | 11 |
| 2014 | 11 | 10 |
| 2015 | 8 | 10 |
| 2016 | 14 | 12 |
| 2017 | 7 | 11 |
| 2018 | 10 | 15 |
| 2019 | 13 | 9 |
| 2020 | 7 | 20 |
| 2021 | 16 | 26 |
| 2022 | 13 | 41 |
| 2023 | 14 | 43 |
| 2024 | 28 | 15 |
| 2025 | 18 | 31 |
| 2026 | 13 | 15 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Recent patents
- Substrate transfer device21 Jul 2026US 12,686,110 B2Nissin Ion Equipment Co., Ltd.
- Gas distribution faceplate with oblique flow paths16 Jun 2026US 12,654,181 B2Lam Research Corporation
- Control of environment within processing modules9 Jun 2026US 12,652,984 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Semiconductor processing apparatus9 Jun 2026US 12,652,991 B2ASM IP Holding B. V.
- Uniform epitaxial growth over crystalline template19 May 2026US 12,635,197 B2APPLIED Materials.Inc.
- Multiple-chamber semiconductor serial constructing apparatus24 Sep 2026US 2026/0293583 A1Advanced Ion Beam Technology, Inc.
- Semiconductor processing apparatus27 Aug 2026US 2026/0255916 A1
- Integrated substrate processing apparatus and method20 Aug 2026US 2026/0245835 A1Picosun Oy
- Method of treating substrate including identifying condition of substrate13 Aug 2026US 2026/0237612 A1Semes Co., Ltd.
- Automated recipe health optimization23 Jul 2026US 2026/0215225 A1Lam Research Corporation
Most cited
By later US patents
- Vacuum-integrated hardmask processes and apparatus389US 9,778,561 B2Lam Research Corporation · 2017
- Module for high vacuum processing377US 4,622,918 AIntegrated Automation Limited · 1986
- Apparatus and method for high throughput sputtering366US 5,683,561 AConner Peripherals, Inc. · 1997
- Clustertool system software using plasma immersion ion implantation336US 6,321,134 B1Silicon Genesis Corporation · 2001
- Method of making a heterojunction bipolar transistor with SIPOS110US 4,717,681 ATexas Instruments Incorporated · 1988