H10D 30/0227
Having both lightly-doped source and drain extensions and source and drain regions
Official title: {having both lightly-doped source and drain extensions and source and drain regions self-aligned to the sides of the gate, e.g. lightly-doped drain [LDD] MOSFET or double-diffused drain [DDD] MOSFET}
H10D30/0227 (Having both lightly-doped source and drain extensions and source and drain regions) appears on 5,025 US grants and 4,478 published applications in this corpus.
Search patents in H10D- Granted patents
- 5,025
- Published applications
- 4,478
- Assignees
- 512
- Inventors
- 6,198
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1978 | 1 | 0 |
| 1979 | 0 | 0 |
| 1980 | 1 | 0 |
| 1981 | 0 | 0 |
| 1982 | 2 | 0 |
| 1983 | 3 | 0 |
| 1984 | 1 | 0 |
| 1985 | 4 | 0 |
| 1986 | 11 | 0 |
| 1987 | 10 | 0 |
| 1988 | 15 | 0 |
| 1989 | 25 | 0 |
| 1990 | 26 | 0 |
| 1991 | 33 | 0 |
| 1992 | 35 | 0 |
| 1993 | 47 | 0 |
| 1994 | 38 | 0 |
| 1995 | 58 | 0 |
| 1996 | 75 | 0 |
| 1997 | 83 | 0 |
| 1998 | 128 | 0 |
| 1999 | 193 | 0 |
| 2000 | 247 | 0 |
| 2001 | 239 | 48 |
| 2002 | 176 | 149 |
| 2003 | 154 | 131 |
| 2004 | 170 | 229 |
| 2005 | 157 | 359 |
| 2006 | 210 | 354 |
| 2007 | 215 | 349 |
| 2008 | 187 | 348 |
| 2009 | 213 | 278 |
| 2010 | 234 | 220 |
| 2011 | 237 | 236 |
| 2012 | 181 | 238 |
| 2013 | 229 | 214 |
| 2014 | 231 | 162 |
| 2015 | 184 | 215 |
| 2016 | 179 | 160 |
| 2017 | 130 | 96 |
| 2018 | 114 | 87 |
| 2019 | 109 | 109 |
| 2020 | 95 | 94 |
| 2021 | 86 | 90 |
| 2022 | 66 | 80 |
| 2023 | 63 | 78 |
| 2024 | 65 | 55 |
| 2025 | 44 | 61 |
| 2026 | 21 | 38 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
Recent patents
- Transistor structure and methods of formation6 Oct 2026US 12,757,428 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Manufacturing method of semiconductor structure and semiconductor structure29 Sep 2026US 12,751,069 B2Changxin Jidian (Beijing) Memory Technologies Co., Ltd.
- Threshold voltage modulation by gate height variation22 Sep 2026US 12,745,430 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Photo mask and lithography method using the same25 Aug 2026US 12,721,115 B2Taiwan Semiconductor Manufacturing Company.Ltd
- RF switch device and method of manufacturing same14 Jul 2026US 12,685,177 B2DB HiTek Co., Ltd.
- Semiconductor device17 Sep 2026US 2026/0282429 A1Kabushiki Kaisha Toshiba
- Semiconductor device including gate structure27 Aug 2026US 2026/0255589 A1Samsung Electronics Co., Ltd.
- Semiconductor device and method of manufacturing the same27 Aug 2026US 2026/0255628 A1Powerchip Semiconductor Manufacturing Corporation
- Methods of forming semiconductor layer stacks comprising at least a portion of a vertical channel transistor structure20 Aug 2026US 2026/0247877 A1ASM IP Holding B. V.
- Two-rotation gate-edge diode leakage reduction for mos6 Aug 2026US 2026/0231464 A1
Most cited
By later US patents
- Active programmable electronic devices for molecular biological analysis and diagnostics1,006US 5,605,662 ANanogen, Inc. · 1997
- Low temperature CVD process with selected stress of the CVD layer on CMOS devices559US 7,393,765 B2APPLIED Materials.Inc. · 2008
- Method of producing thin films513US 7,563,715 B2ASM International N.V. · 2009
- Method to increase silicon nitride tensile stress using nitrogen plasma in-situ treatment and ex-situ UV cure481US 8,138,104 B2APPLIED Materials.Inc. · 2012
- Method for silicon based dielectric chemical vapor deposition432US 7,473,655 B2APPLIED Materials.Inc. · 2009