H05G 2/001
Production of x-ray radiation generated from plasma
Official title: {Production of X-ray radiation generated from plasma}
H05G2/001 (Production of x-ray radiation generated from plasma) appears on 1,541 US grants and 1,708 published applications in this corpus.
Search patents in H05G- Granted patents
- 1,541
- Published applications
- 1,708
- Assignees
- 238
- Inventors
- 1,839
- Latest grant
- 6 Oct 2026
Filings by year
| Year | Granted patents | Published applications |
|---|---|---|
| 1976 | 1 | 0 |
| 1977 | 1 | 0 |
| 1978 | 0 | 0 |
| 1979 | 0 | 0 |
| 1980 | 3 | 0 |
| 1981 | 0 | 0 |
| 1982 | 1 | 0 |
| 1983 | 1 | 0 |
| 1984 | 0 | 0 |
| 1985 | 5 | 0 |
| 1986 | 9 | 0 |
| 1987 | 5 | 0 |
| 1988 | 5 | 0 |
| 1989 | 5 | 0 |
| 1990 | 4 | 0 |
| 1991 | 2 | 0 |
| 1992 | 1 | 0 |
| 1993 | 1 | 0 |
| 1994 | 3 | 0 |
| 1995 | 3 | 0 |
| 1996 | 8 | 0 |
| 1997 | 5 | 0 |
| 1998 | 2 | 0 |
| 1999 | 5 | 0 |
| 2000 | 11 | 0 |
| 2001 | 14 | 4 |
| 2002 | 15 | 21 |
| 2003 | 19 | 21 |
| 2004 | 23 | 37 |
| 2005 | 25 | 36 |
| 2006 | 34 | 51 |
| 2007 | 33 | 47 |
| 2008 | 42 | 53 |
| 2009 | 43 | 39 |
| 2010 | 33 | 63 |
| 2011 | 27 | 54 |
| 2012 | 43 | 68 |
| 2013 | 69 | 73 |
| 2014 | 88 | 106 |
| 2015 | 65 | 80 |
| 2016 | 94 | 105 |
| 2017 | 96 | 76 |
| 2018 | 82 | 80 |
| 2019 | 95 | 81 |
| 2020 | 93 | 112 |
| 2021 | 79 | 91 |
| 2022 | 94 | 91 |
| 2023 | 75 | 105 |
| 2024 | 70 | 78 |
| 2025 | 72 | 76 |
| 2026 | 37 | 60 |
By publication year. Applications have been published since 2001. 2026 runs to 8 Oct.
Subgroups
Granted patents
- H05G 2/002Supply of the plasma generating material667
- H05G 2/008Involving an energy-carrying beam in the process of plasma generation581
- H05G 2/009Auxiliary arrangements not involved in the plasma generation519
- H05G 2/003The plasma being generated from a material in a liquid or gas195
- H05G 2/007Involving electric or magnetic fields in the process of plasma generation118
Recent patents
- High brightness LPP EUV light source with fast rotating target and method of cooling thereof6 Oct 2026US 12,757,310 B2Isteq Group Holding B.V.
- Optical system and method for a radiation source6 Oct 2026US 12,757,311 B2ASML Netherlands B. V.
- Extreme ultraviolet light source device6 Oct 2026US 12,757,312 B2Samsung Electronics Co., Ltd.
- System and method for monitoring and controlling extreme ultraviolet photolithography processes29 Sep 2026US 12,748,353 B2Taiwan Semiconductor Manufacturing Company.Ltd
- Extreme ultraviolet light generation apparatus and electronic device manufacturing method29 Sep 2026US 12,750,939 B2Gigaphoton Inc.
- Extreme ultraviolet lithography system8 Oct 2026US 2026/0310108 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Optical system, method of use, and method of fabrication1 Oct 2026US 2026/0299429 A1xLight Inc.
- Laser synchronization with target motion for euv source optimization1 Oct 2026US 2026/0304584 A1KLA Corporation
- Semiconductor system inspection tool and methods of operation1 Oct 2026US 2026/0304585 A1Taiwan Semiconductor Manufacturing Company.Ltd
- Fluid dispensing system and method24 Sep 2026US 2026/0290766 A1ASML Netherlands B. V.
Most cited
By later US patents
- Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source260US 7,196,342 B2Cymer, Inc. · 2007
- Capillary discharge extreme ultraviolet lamp source for EUV microlithography and other related applications210US 6,031,241 AUniversity of Central Florida · 2000
- High brightness X-ray metrology162US 7,929,667 B1KLA-Tencor Corporation · 2011
- Collector in an extreme ultraviolet lithography system with optimal air curtain protection151US 9,869,934 B2Taiwan Semiconductor Manufacturing Company.Ltd · 2018
- Plasma focus high energy photon source93US 5,763,930 ACymer, Inc. · 1998